Paper
13 November 1998 Design of a LIGA beamline using a multilayer-coated reflection mirror
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Abstract
This paper describes the beamline optics for deep-etch x-ray lithography. In order to obtain a higher reflectivity than that provided by a mirror with a monolayer coating at photon energies of 4 to 6 keV, multilayer mirrors with a constant and graded d-spacing were developed. At an energy of 6 keV, a measured reflectivity of more than 80 percent and a bandwidth of 1 keV were obtained for a mirror with a Ni/C multilayer coating and a constant d-spacing. Moreover, it was found that, for energies form 4 to 6 keV, a multilayer mirror with a graded d-spacing provided a higher reflectivity and a wider bandwidth than a mirror with a Pt monolayer coating. A multilayer reflection mirror is a promising component of beamline optics for use in microfabrication and the structural analysis of materials.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroo Kinoshita, Yachiyo Kimpara, T. Uruga, Takeo Watanabe, Masahito Niibe, Yuriy Ya. Platonov, and James L. Wood "Design of a LIGA beamline using a multilayer-coated reflection mirror", Proc. SPIE 3447, Advances in Mirror Technology for Synchrotron X-Ray and Laser Applications, (13 November 1998); https://doi.org/10.1117/12.331117
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Cited by 1 scholarly publication.
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KEYWORDS
Mirrors

Reflectivity

Multilayers

Platinum

Coating

X-rays

Reflection

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