Fabrication and performance of etched multilayer x-ray optics

Zhanshan Wang; Yueying Ma; Jianlin Cao; Xingdan Chen; Xiangdong Xu; Yilin Hong; Shaojun Fu

doi:10.1117/12.332521

11 December 1998 Fabrication and performance of etched multilayer x-ray optics

Zhanshan Wang, Yueying Ma, Jianlin Cao, Xingdan Chen, Xiangdong Xu, Yilin Hong, Shaojun Fu

Proceedings Volume 3448, Crystal and Multilayer Optics; (1998) https://doi.org/10.1117/12.332521
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

We present the recent advances achieved in the Changchun Institute of Optics and Fine Mechanics, Chinese Academy of Science, in the field of the soft X-ray etched multilayer optics. In the present study, Mo and Si have been chosen as materials for the scattering layer and space layer soft X-ray multilayer, respectively. The fabrication of Mo/Si multilayer used by the magnetron sputtering, the patterned resist was obtained by optical holography, and the pattern of the resist was transferred into the multilayer by the ion beam etching. The several components based on soft X-ray etched multilayer were measured by grazing incidence X-ray reflectance measurements at (lambda) equals 0.154 nm (Cu-K_(alpha )) using a conventional diffractometer.

Citation Download Citation

Zhanshan Wang, Yueying Ma, Jianlin Cao, Xingdan Chen, Xiangdong Xu, Yilin Hong, and Shaojun Fu "Fabrication and performance of etched multilayer x-ray optics", Proc. SPIE 3448, Crystal and Multilayer Optics, (11 December 1998); https://doi.org/10.1117/12.332521

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