Design and fabrication of W/Si multilayer mirrors for the K-edge of Ti

Shumin Zhang; Zhanshan Wang; Hongchang Wang; Fengli Wang; Zhongxiang Gu; Wenjuan Wu; Zhong Zhang; Yao Xu; Shuji Qin; Lingyan Chen

doi:10.1117/12.668095

1 February 2006 Design and fabrication of W/Si multilayer mirrors for the K-edge of Ti

Shumin Zhang, Zhanshan Wang, Hongchang Wang, Fengli Wang, Zhongxiang Gu, Wenjuan Wu, Zhong Zhang, Yao Xu, Shuji Qin, Lingyan Chen

Author Affiliations +

Proceedings Volume 6034, ICO20: Optical Design and Fabrication; 60340C (2006) https://doi.org/10.1117/12.668095
Event: ICO20:Optical Devices and Instruments, 2005, Changchun, China

Abstract

The periodic mulitlayer with high reflectivity and small full width at half maximum (FWHM) in hard x-ray range, while the reflectivity of non-periodic multilayer decreases and FWHM increase. Therefore, the optimum coating design must be found out as a compromise between the requirements for the reflectivity and the FWHM. We have used purely numerical techniques to design broad angular multilayer mirror in angle intervals (2.9°-3.1°), which is starting from an appropriate periodic multilayer structure. In our method, the risk of local minimization of the merit function disappears, because we refined the desired depth-distribution of the period using a direct numerical algorithm and the analytical solution as a starting point for computer calculation. The plateau reflectivity can be obtained in a few minutes. The main feature of our approach is the use of an analytical solution as a starting point for direct computer search, and the desired results can be given in a reasonable time. This technique is able to design almost any given reflectivity spectrum both energy- and angle-dependent and in a reasonable amount of time. The periodic and non-periodic W/Si multilayer for grazing incidence multilayer mirrors at the K-edge of Ti (0.275 nm) were both designed and fabricated by high vacuum DC magnetron sputtering coater model JGP560C6, and the multilayer films were characterized by X-ray reflectivity measurements on a laboratory x-ray diffractometer(XRD) and the atomic force microscope (AFM). We find good agreement of the changing trend of surface roughness between the simulation of XRD and measurement of AFM.

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Shumin Zhang, Zhanshan Wang, Hongchang Wang, Fengli Wang, Zhongxiang Gu, Wenjuan Wu, Zhong Zhang, Yao Xu, Shuji Qin, and Lingyan Chen "Design and fabrication of W/Si multilayer mirrors for the K-edge of Ti", Proc. SPIE 6034, ICO20: Optical Design and Fabrication, 60340C (1 February 2006); https://doi.org/10.1117/12.668095

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KEYWORDS

Multilayers

Reflectivity

X-rays

Mirrors

Hard x-rays

Atomic force microscopy

Sputter deposition

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