Analysis of errors and calibration method for manufacturing multilevel diffractive optical element by ion etching

Yongqi Fu; Zhenwu Lu; Yueying Ma; Zhicheng Weng

doi:10.1117/12.318298

5 August 1998 Analysis of errors and calibration method for manufacturing multilevel diffractive optical element by ion etching

Yongqi Fu, Zhenwu Lu, Yueying Ma, Zhicheng Weng

Author Affiliations +

Proceedings Volume 3557, Current Developments in Optical Elements and Manufacturing; (1998) https://doi.org/10.1117/12.318298
Event: Photonics China '98, 1998, Beijing, China

Abstract

Fabrication errors and its affecting factors were analyzed for multilevel DOE in this paper. A method of Moire fringe alignment was put forth. It was proved by actual manufacturing that this way is available for aligning positioning error.

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Yongqi Fu, Zhenwu Lu, Yueying Ma, and Zhicheng Weng "Analysis of errors and calibration method for manufacturing multilevel diffractive optical element by ion etching", Proc. SPIE 3557, Current Developments in Optical Elements and Manufacturing, (5 August 1998); https://doi.org/10.1117/12.318298

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