Emission from a gas puff target irradiated with a Nd:YAG laser for EUV and x-ray lithography

Henryk Fiedorowicz; Hiroyuki Daido; Andrzej Bartnik; Noriyuki Sakaya; Masayuki Suzuki; Viliam Kmetik; Miroslaw Szczurek; Thomas Wilhein

doi:10.1117/12.351112

25 June 1999 Emission from a gas puff target irradiated with a Nd:YAG laser for EUV and x-ray lithography

Henryk Fiedorowicz, Hiroyuki Daido, Andrzej Bartnik, Noriyuki Sakaya, Masayuki Suzuki, Viliam Kmetik, Miroslaw Szczurek, Thomas Wilhein

Author Affiliations +

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351112
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Soft x-ray and extreme-UV emissions form plasmas produced using a gas puff target irradiated with a Nd:YAG laser has been investigated. The use of the gas puff targets, create by pulsed injection of high-density gas through a nozzle, eliminates the production of debris associated with solid targets. Laser pulses of either 0.9 ns or 10 ns time duration with energies up to 0.7 J were used to produce plasmas. Emissions in the 1-22 nm wavelength range from laser-produced gas puff plasma were characterized for various gases. The spectral measurements were performed with the use of grating spectrographs equipped with the back- illuminated CCD camera. The source sizes was measured using the Fresnel zone plate imaging system and the grating spectrograph equipped with a slit placed perpendicularly to the dispersion direction. The obtained results would allow to develop an efficient and debrisless laser-produced radiation source for applications in proximity x-ray lithography and extreme UV lithography technologies.

Citation Download Citation

Henryk Fiedorowicz, Hiroyuki Daido, Andrzej Bartnik, Noriyuki Sakaya, Masayuki Suzuki, Viliam Kmetik, Miroslaw Szczurek, and Thomas Wilhein "Emission from a gas puff target irradiated with a Nd:YAG laser for EUV and x-ray lithography", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351112

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