Paper
11 January 2000 Characterization of laser-produced gas-puff plasmas for soft x-ray projection lithography
Masayuki Suzuki, Hiroyuki Daido, Il Woo Choi, Huajing Tang, Susumu Yamagami, Hideo Nagatomo, Andrzej Bartnik, Henryk Fiedorowicz, Wei Yu, Takeyoshi Nakayama
Author Affiliations +
Proceedings Volume 3886, High-Power Lasers in Energy Engineering; (2000) https://doi.org/10.1117/12.375161
Event: Advanced High-Power Lasers and Applications, 1999, Osaka, Japan
Abstract
We characterize a laser produced gas puff plasma for soft x- ray generation. Strong emissions at 11.4 nm wavelength region was observed, using krypton and xenon gas puff targets irradiated by a 0.7J/8ns Nd:YAG laser. Space resolved x-ray spectra measurement indicated that the source size depends on the Rayleigh length and the gas density profile. A channeling effect for larger tare size which is connected with the thermal focusing has been observed.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masayuki Suzuki, Hiroyuki Daido, Il Woo Choi, Huajing Tang, Susumu Yamagami, Hideo Nagatomo, Andrzej Bartnik, Henryk Fiedorowicz, Wei Yu, and Takeyoshi Nakayama "Characterization of laser-produced gas-puff plasmas for soft x-ray projection lithography", Proc. SPIE 3886, High-Power Lasers in Energy Engineering, (11 January 2000); https://doi.org/10.1117/12.375161
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KEYWORDS
X-rays

Plasmas

X-ray lithography

Gas lasers

Krypton

Xenon

Nd:YAG lasers

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