Continuous metal removal technique for resist resins

Stan F. Wanat; Douglas S. McKenzie; M. Dalil Rahman

doi:10.1117/12.436877

24 August 2001 Continuous metal removal technique for resist resins

Stan F. Wanat, Douglas S. McKenzie, M. Dalil Rahman

Proceedings Volume 4345, Advances in Resist Technology and Processing XVIII; (2001) https://doi.org/10.1117/12.436877
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Modern resists require very pure raw materials to insure highest quality images. Many methods have been developed to reduce metals in resins used to make photoresists. Extractive washing techniques and ion exchange methods have been the predominant methods used to reduce metal levels for these critical raw materials. This has been especially important for the novolak resins because of the generally poor quality of the starting materials used to make them and by the nature of the resin isolation steps traditionally used. Both of the commonly used cleaning methods are time consuming and are predominantly batch processes. Based upon techniques developed to efficiently fractionate resins, we have developed a technique for the rapid, continuous reduction of metal contaminants in film forming resin solutions by an extractive method using a double inlet liquid/liquid centrifuge.

Citation Download Citation

Stan F. Wanat, Douglas S. McKenzie, and M. Dalil Rahman "Continuous metal removal technique for resist resins", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); https://doi.org/10.1117/12.436877

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