X-ray study of surfaces and interfaces

Victor E. Asadchikov; Inna N. Bukreeva; Angela Duparre; Igor V. Kozhevnikov; Yury S. Krivonosov; Christian Morawe; Mikhail V. Pyatakhin; Joerg Steinert; Alexander V. Vinogradov; Eric Ziegler

doi:10.1117/12.450102

10 December 2001 X-ray study of surfaces and interfaces

Victor E. Asadchikov, Inna N. Bukreeva, Angela Duparre, Igor V. Kozhevnikov, Yury S. Krivonosov, Christian Morawe, Mikhail V. Pyatakhin, Joerg Steinert, Alexander V. Vinogradov, Eric Ziegler

Author Affiliations +

Proceedings Volume 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II; (2001) https://doi.org/10.1117/12.450102
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

The analysis of the roughness of B₄C films of different thickness as well as W/B₄C multilayer mirrors of different periods is performed basing on AFM and x-ray scattering (XRS) measurements. It is demonstrated that the linear model of a film growth is able to describe the whole set of experimental data including films at initial island stage of growth, if suppose the relaxation processes of a film surface to depend on the film thickness. New approach to the inverse problem of x-ray reflectometry consisting in inferring the dielectric constant profile from the reflectivity data is shortly discussed.

Citation Download Citation

Victor E. Asadchikov, Inna N. Bukreeva, Angela Duparre, Igor V. Kozhevnikov, Yury S. Krivonosov, Christian Morawe, Mikhail V. Pyatakhin, Joerg Steinert, Alexander V. Vinogradov, and Eric Ziegler "X-ray study of surfaces and interfaces", Proc. SPIE 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, (10 December 2001); https://doi.org/10.1117/12.450102

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