Paper
24 July 2002 Fabrication of photonic crystals in multilayer organic films
Author Affiliations +
Proceedings Volume 4608, Nanostructure Science, Metrology, and Technology; (2002) https://doi.org/10.1117/12.437272
Event: Workshop on Nanostructure Science, Metrology, and Technology, 2001, Gaithersburg, MD, United States
Abstract
We present a novel method for making 2D photonic crystal structures. The method relies on exposing a multilayer electron beam resist. The different layers exhibit different dissolution rates in the developer, which makes it possible to produce a perforated membrane released from the substrate if the resist closest to the substrate has a higher dissolution rate than the resist on the surface. The entire structure is created in a single development step. Various structures fabricated with this method are reported.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Janusz A. Murakowski and Dennis W. Prather "Fabrication of photonic crystals in multilayer organic films", Proc. SPIE 4608, Nanostructure Science, Metrology, and Technology, (24 July 2002); https://doi.org/10.1117/12.437272
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KEYWORDS
Photonic crystals

Polymethylmethacrylate

Electron beam lithography

Multilayers

Refractive index

Semiconductors

Waveguides

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