Paper
14 May 2002 Contrasts in writing photonic structures with ultrafast and ultraviolet lasers
Dragan Coric, Peter R. Herman, Kevin P. Chen, Xiaoli Midori Wei, Paul B. Corkum, V. Ravi Bhardwaj, David M. Rayner
Author Affiliations +
Abstract
This paper contrasts the photosensitivity responses and processing windows between two extreme approaches in laser structuring of photonic devices: ultrafast and deep-ultraviolet F2 lasers. Low-loss single mode waveguides were formed by scanning in fused silica the focused light from a 50-fs Ti:Sapphire laser and a 157-nm 15-ns F2 laser. The latter source represents the first known demonstration of writing buried waveguide structures in bulk glass without driving ultrafast-laser interaction physics. For the ultrafast laser, a refractive index change of 1.0 x 10-3 was noted after an accumulated fluence of ~10 kJ/cm2, a high scanning speed of ~100 micrometers /s, and 100-kHz repetition rate. Longitudinal and side-writing techniques were employed and waveguides were characterized at 0.633-micrometers and 1.5-micrometers wavelengths. For the F2 laser, photosensitivity responses were similar in germanosilicate planar waveguides, and ~10-fold smaller in fused silica. Waveguide writing speeds were ~100-fold slower than for the ultrafast laser because of the smaller 100-Hz repetition rate. Overall, ultrafast lasers and ultraviolet lasers offer strong photosensitivity responses in silica-based glasses that address niche applications in fabricating complex three-dimensional photonic structures and trimming optical circuits for telecommunication applications.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dragan Coric, Peter R. Herman, Kevin P. Chen, Xiaoli Midori Wei, Paul B. Corkum, V. Ravi Bhardwaj, and David M. Rayner "Contrasts in writing photonic structures with ultrafast and ultraviolet lasers", Proc. SPIE 4638, Optical Devices for Fiber Communication III, (14 May 2002); https://doi.org/10.1117/12.467466
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Cited by 6 scholarly publications.
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KEYWORDS
Waveguides

Silica

Ultrafast lasers

Refractive index

Glasses

Ultraviolet radiation

Ultrafast phenomena

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