High-speed and efficient control of refractive index change of fused silica by multiwavelength excitation process using F2 and KrF excimer lasers

Kotaro Obata; Koji Sugioka; Tatsuya Kono; Hiroshi Takai; Koichi Toyoda; Katsumi Midorikawa

doi:10.1117/12.497735

19 February 2003 High-speed and efficient control of refractive index change of fused silica by multiwavelength excitation process using F₂ and KrF excimer lasers

Kotaro Obata, Koji Sugioka, Tatsuya Kono, Hiroshi Takai, Koichi Toyoda, Katsumi Midorikawa

Author Affiliations +

Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.497735
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan

Abstract

A multiwavelength excitation process using F₂ and KrF excimer lasers for high-efficiency and high-speed refractive index modification of fused silica is demonstrated. We find that this process is essentially superior to conventional single-wavelength F₂ laser processing. The multiwavelength excitation process achieves twice of diffraction efficiency compared with that of single-wavelength F₂ laser irradiation sample at the same number of total photons supplied to the sample. This high-speed and high-efficiency modification is realized within ±50 ns of the delay time of each laser beam irradiation. In addition, the refractive index change of the multiwavelength sample was increased to 8.2×10^-3, which is 1.78 times larger than that of single-wavelength F₂ laser irradiation sample at same irradiation time. This superiority of the wavelength excitation process is attributed to resonance photoionization-like process based on excited state absorption in fused silica.

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Kotaro Obata, Koji Sugioka, Tatsuya Kono, Hiroshi Takai, Koichi Toyoda, and Katsumi Midorikawa "High-speed and efficient control of refractive index change of fused silica by multiwavelength excitation process using F₂ and KrF excimer lasers", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); https://doi.org/10.1117/12.497735

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