Nanometer-accurate grating fabrication with scanning beam interference lithography

Carl G. Chen; Paul T. Konkola; Ralf K. Heilmann; Chulmin Joo; Mark L. Schattenburg

doi:10.1117/12.469431

13 November 2002 Nanometer-accurate grating fabrication with scanning beam interference lithography

Carl G. Chen, Paul T. Konkola, Ralf K. Heilmann, Chulmin Joo, Mark L. Schattenburg

Proceedings Volume 4936, Nano- and Microtechnology: Materials, Processes, Packaging, and Systems; (2002) https://doi.org/10.1117/12.469431
Event: SPIE's International Symposium on Smart Materials, Nano-, and Micro- Smart Systems, 2002, Melbourne, Australia

Abstract

We are developing a Scanning Beam Interference Lithography (SBIL) system. SBIL represents a new paradigm in semiconductor metrology, capable of patterning large-area linear gratings and grids with nanometer overall phase accuracy. Realizing our accuracy goal is a major challenge because the interference fringes have to be locked to a moving substrate with nanometer spatial phase errors while the period of the fringes has to be stabilized to approximately one part per million. In this paper, we present a review of the SBIL design, and report recent progress towards prototyping the first-ever SBIL tool.

Citation Download Citation

Carl G. Chen, Paul T. Konkola, Ralf K. Heilmann, Chulmin Joo, and Mark L. Schattenburg "Nanometer-accurate grating fabrication with scanning beam interference lithography", Proc. SPIE 4936, Nano- and Microtechnology: Materials, Processes, Packaging, and Systems, (13 November 2002); https://doi.org/10.1117/12.469431

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