Paper
14 November 2003 A laser beam homogenizer with a variable output cross section
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Proceedings Volume 5147, ALT'02 International Conference on Advanced Laser Technologies; (2003) https://doi.org/10.1117/12.537572
Event: ALT'02 International Conference on Advanced laser Technologies, 2002, Adelboden, Switzerland
Abstract
New studies concerning the performance of Pd films embedded with hydrogen are presented. The films were realized on Si wafers by thermal evaporation and soaked in hdyrogen for different days. Every experiment processed two or more samples, one of which was irradiated by an excimer laser the day before its analysis. The laser fluence was lower than 25 mJ/cm2 in order to avoid the film ablation and the maximum gas pressure was 5 bar. The samples were analyzed by scanning electron microscopy and an electron microanalysis. Just after four processing days the films showed a morphological modification while with more than eight processing days new elements were observed, Na, S, Ca nd Rn. The found elements were absent in the no-treated samples.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Daniele Murra, Paolo Di Lazzaro, Sarah Bollanti, and Giuseppe Felici "A laser beam homogenizer with a variable output cross section", Proc. SPIE 5147, ALT'02 International Conference on Advanced Laser Technologies, (14 November 2003); https://doi.org/10.1117/12.537572
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KEYWORDS
Zoom lenses

Optical components

Excimer lasers

Near field

Silicon

Software development

CCD cameras

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