Optimization of a 65-nm alternating phase-shift quartz etch process

Scott A. Anderson; Rex B. Anderson III; Melisa J. Buie; Madhavi Chandrachood; Jason O. Clevenger; Yvette Lee; Nicole L. Sandlin; Jian Ding

doi:10.1117/12.518231

17 December 2003 Optimization of a 65-nm alternating phase-shift quartz etch process

Scott A. Anderson, Rex B. Anderson III, Melisa J. Buie, Madhavi Chandrachood, Jason O. Clevenger, Yvette Lee, Nicole L. Sandlin, Jian Ding

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Proceedings Volume 5256, 23rd Annual BACUS Symposium on Photomask Technology; (2003) https://doi.org/10.1117/12.518231
Event: Photomask Technology, 2003, Monterey, California, United States

Abstract

As mask features advance to the 65 nm technology node, the ability to develop advanced phase shifting masks with reliable and repeatable processes is becoming increasingly important. Changes in process conditions (i.e. power, pressure, gases, etc.), play an important role in the reduction of RIE lag, micro-trenching, loading and the improvement of sidewall profiles. In this study, the effects of changing process conditions on the Tetra^TM II Photomask Etch System were investigated. Process development was conducted to screen for a quartz etch process regime with enhanced performance.

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Scott A. Anderson, Rex B. Anderson III, Melisa J. Buie, Madhavi Chandrachood, Jason O. Clevenger, Yvette Lee, Nicole L. Sandlin, and Jian Ding "Optimization of a 65-nm alternating phase-shift quartz etch process", Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); https://doi.org/10.1117/12.518231

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