Combined nanoimprint and photolithography technique with a hybrid mold

Xing Cheng; Meng-Han Chang; L. Jay Guo

doi:10.1117/12.536121

20 May 2004 Combined nanoimprint and photolithography technique with a hybrid mold

Xing Cheng, Meng-Han Chang, L. Jay Guo

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.536121
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Nanoimprint lithography (NIL) has been successfully employed in nanoscale patterning, however, it is known to have limitations in replicating large scale (hundreds of microns and larger) and nanoscale patterns simultaneously. We present a new lithographic technique that integrates photolithography into the NIL patterning process. This technique uses a hybrid mold that has large metal pads embedded in a transparent NIL mold. Such a hybrid mold allows both large and nanoscale patterns to be replicated in one step by a combination of imprinting and photolithography. In addition, this new technique offers the advantages of simplifying residual layer distribution and avoiding NIL failures resulting from insufficient polymer flow, and can also eliminate the oxygen plasmon etching process used in NIL to remove the residual polymers.

Citation Download Citation

Xing Cheng, Meng-Han Chang, and L. Jay Guo "Combined nanoimprint and photolithography technique with a hybrid mold", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.536121

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