Status of EUV-lamp development and demonstration of applications

Rainer Lebert; Christian Wies; Bernhard Jaegle; Larissa Juschkin; Ulrich Bieberle; Manfred Meisen; Willi Neff; Klaus Bergmann; Konstantin Walter; Oliver Rosier; Max Christian Schuermann; Thomas Missalla

doi:10.1117/12.538058

20 May 2004 Status of EUV-lamp development and demonstration of applications

Rainer Lebert, Christian Wies, Bernhard Jaegle, Larissa Juschkin, Ulrich Bieberle, Manfred Meisen, Willi Neff, Klaus Bergmann, Konstantin Walter, Oliver Rosier, Max Christian Schuermann, Thomas Missalla

Author Affiliations +

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.538058
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Compact, flexible laboratory sources offer advanced flexibility in developing components for EUV-lithography by supplementing beamlines at storage rings. Hence, they are the basis for transferring EUV-metrology and technology to individual, industrial and university R&D labs. Laboratory sources have features similar to the sources planned for EUVL production on one hand and offer high flexibility like storage ring beamlines on the other hand. Discharge based EUV sources offer some flexibility, which allow for tuning of the spectral and spatial characteristics of their emission. Depending on the system complexity sources can be supplied in various forms ranging from low budget semi-manual systems over OEM components to fully automatic stand-alone sources. As power scaling has been demonstrated by just adding higher power generators and cooling, these sources can be matched to various levels of flux requirements. AIXUV’s discharge based EUV-sources have been used as beamline supplement for tasks closely connected with the development of EUV-Lithography. Examples are: development of tools for EUV source characterization (prototype testing, qualification and calibration), “in-band-EUV” open frame resist exposure, reflectometry of EUV mask blanks and EUV mirrors and for basic research using XUV radiation as thin film analytics and EUV microscopy.

Citation Download Citation

Rainer Lebert, Christian Wies, Bernhard Jaegle, Larissa Juschkin, Ulrich Bieberle, Manfred Meisen, Willi Neff, Klaus Bergmann, Konstantin Walter, Oliver Rosier, Max Christian Schuermann, and Thomas Missalla "Status of EUV-lamp development and demonstration of applications", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.538058

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available