Assessments on process parameters' influences to the proximity correction

Eun-Mi Lee; Sung-Woo Lee; Doo-Youl Lee; Soo-Han Choi; Joo-On Park; Sung-Gon Jung; Gi-Sung Yeo; Jung-Hyeon Lee; Han-Ku Cho; Woo-Sung Han

doi:10.1117/12.536341

24 May 2004 Assessments on process parameters' influences to the proximity correction

Eun-Mi Lee, Sung-Woo Lee, Doo-Youl Lee, Soo-Han Choi, Joo-On Park, Sung-Gon Jung, Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, Woo-Sung Han

Author Affiliations +

Proceedings Volume 5375, Metrology, Inspection, and Process Control for Microlithography XVIII; (2004) https://doi.org/10.1117/12.536341
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

The on-chip variation (OCV) should be critically controlled to obtain the high speed performance in logic devices. The variation from proximity dominantly contributes to OCV. This proximity effect can be compensated by applying well-treated optical proximity correction (OPC). Therefore, the accuracy of OPC is needed, and methods to enhance its result have to be devised. The optical proximity behaviors are severely varied according to the material and optical conditions. In point of material, the proximity property is affected by species of photo-resist (PR) and change of post exposure bake (PEB) conditions. 3σ values of proximity variation are changed from 9.3 nm to 15.2 nm according to PR species. Also, proximity variations change from 16.2 nm to 13.8 nm is observed according to PEB condition. Proximity variations changes of 11.6 nm and 15.2 nm are measured by changing the illumination condition. In order not to seriously deteriorate OPC, these factors should be fixed after the OPC rules are extracted. Proximity variations of 11.4 nm, 13.9 nm and 15.2 nm are observed for the mask mean-to-targets (MTT) of 0 nm, 2nm, and 4nm, respectively. The decrease the OPC grid size enhances the correction resolution and the OCV is reduced. The selective bias rule is generated by model using grid size of 1 nm and 0.5 nm. For the nominal CD of 87 nm, proximity variations are measured to be 14.6 nm and 11.4 nm for 1 nm and 0.5 nm grid sizes, respectively. The enhancement amount of proximity variations are 9.2 nm corresponding to 39% improvement. The CD uniformity improvement for adopting the small grid size is confirmed by measuring the CD uniformity on real SRAM pattern. CD uniformities are measured 11nm and 9.1nm for grid size of 1 nm and 0.5 nm, respectively. 22% improvement of the CD uniformity is achieved.

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Eun-Mi Lee, Sung-Woo Lee, Doo-Youl Lee, Soo-Han Choi, Joo-On Park, Sung-Gon Jung, Gi-Sung Yeo, Jung-Hyeon Lee, Han-Ku Cho, and Woo-Sung Han "Assessments on process parameters' influences to the proximity correction", Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); https://doi.org/10.1117/12.536341

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