Physisorbed buffer layer as a template for pulsed laser patterning of metallic thin films: an alternative approach for photolithography

Gabriel Kerner; Ori Stein; Micha Asscher

doi:10.1117/12.557621

14 October 2004 Physisorbed buffer layer as a template for pulsed laser patterning of metallic thin films: an alternative approach for photolithography

Gabriel Kerner, Ori Stein, Micha Asscher

Author Affiliations +

Proceedings Volume 5513, Physical Chemistry of Interfaces and Nanomaterials III; (2004) https://doi.org/10.1117/12.557621
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

Buffer Layer Assisted Laser Patterning (BLALP) method is presented, for patterning metallic layers on surfaces, using laser desorption of a physisorbed buffer layer, e.g. Xe, CO₂ or H₂O. This technique is based on the utilization of a low power laser pulse used as the photolithographic printer of a metallic thin film. Using a weakly bound buffer material as the template for laser patterning, led to the development of two complementary procedures, 'positive' and 'negative' BLALP. It is discussed as a potential alternative for standard photo-lithography, promising a cleaner, more cost effective, better resolution and more environmentally friendly procedure.

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Gabriel Kerner, Ori Stein, and Micha Asscher "Physisorbed buffer layer as a template for pulsed laser patterning of metallic thin films: an alternative approach for photolithography", Proc. SPIE 5513, Physical Chemistry of Interfaces and Nanomaterials III, (14 October 2004); https://doi.org/10.1117/12.557621

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