Patterning performance of most recent e-beam-sensitive CARs for advanced mask making: an update

Anatol Schwersenz; Joerg Butschke; Axel Feicke; Mathias Irmscher; Peter Voehringer

doi:10.1117/12.568819

6 December 2004 Patterning performance of most recent e-beam-sensitive CARs for advanced mask making: an update

Anatol Schwersenz, Joerg Butschke, Axel Feicke, Mathias Irmscher, Peter Voehringer

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.568819
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

Recently developed positive tone CARs (pCAR) and negative tone CARs (nCAR) have been evaluated for mask making using a 50kV e-beam pattern generator. We determined a screening method considering the most important parameters for example resolution, profile, delay influences, line edge roughness (LER), which was identically applied for all investigated resist samples. The screening was accomplished on 6025 chrome blanks using a state-of-the-art mask line. Some of the investigated resists have shown promising progress in terms of straight profile, of reduced footing, of lower line edge roughness and of an almost insensitive influence of the post exposure delay. Unfortunately, all the improvements were not unified in one sample.

Citation Download Citation

Anatol Schwersenz, Joerg Butschke, Axel Feicke, Mathias Irmscher, and Peter Voehringer "Patterning performance of most recent e-beam-sensitive CARs for advanced mask making: an update", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.568819

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