A study of novel overlay targets designs

Yi-Sha Ku; An-Shan Liu; Nigel P. Smith

doi:10.1117/12.598373

10 May 2005 A study of novel overlay targets designs

Yi-Sha Ku, An-Shan Liu, Nigel P. Smith

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.598373
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

We report the results of a study of grating-based target designs for overlay measurement. While improvements to measurement precision may be expected from targets with more pattern information, the main interest in these targets is the hope that they will provide more accurate measurements. In order to test the accuracy of these targets, we have compared data taken using them with data obtained from conventional bar-in-bar targets. In general, good agreement is seen. There are instances, however, where the grating targets all produce a significantly different measurement to the bar-in-bar target. Although this isn’t proof of improvements in measurement accuracy with these newer designs, it does suggest that thorough investigation is warranted.

Citation Download Citation

Yi-Sha Ku, An-Shan Liu, and Nigel P. Smith "A study of novel overlay targets designs", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.598373

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