Phase-shift focus monitoring techniques

Matthew McQuillan; Bill Roberts

doi:10.1117/12.663477

20 March 2006 Phase-shift focus monitoring techniques

Matthew McQuillan, Bill Roberts

Author Affiliations +

Proceedings Volume 6154, Optical Microlithography XIX; 615430 (2006) https://doi.org/10.1117/12.663477
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Depth of focus (DOF) has become a victim of its mathematical relationship with Numerical Aperture (NA). While NA is being increased towards one to maximize scanner resolution capabilities, DOF is being minimized because of its inverse relationship with NA. Moore's law continues to drive the semiconductor industry towards smaller and smaller devices the need for high NA to resolve these shrinking devices will continue to consume the usable depth of focus (UDOF). Due to the shrinking UDOF a demand has been created for a feature or technology that will give engineers the capability to monitor scanner focus. Developing and implementation of various focus monitoring techniques have been used to prevent undetected tool focus excursions. Two overlay techniques to monitor ArF Scanner focus have been evaluated; our evaluation results will be presented here.

Citation Download Citation

Matthew McQuillan and Bill Roberts "Phase-shift focus monitoring techniques", Proc. SPIE 6154, Optical Microlithography XIX, 615430 (20 March 2006); https://doi.org/10.1117/12.663477

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