Inverse lithography technology at low k1: placement and accuracy of assist features

Andrew Moore; Timothy Lin; Yong Liu; Gordon Russell; Linyong Pang; Daniel Abrams

doi:10.1117/12.693039

20 October 2006 Inverse lithography technology at low k1: placement and accuracy of assist features

Andrew Moore, Timothy Lin, Yong Liu, Gordon Russell, Linyong Pang, Daniel Abrams

Proceedings Volume 6349, Photomask Technology 2006; 63494T (2006) https://doi.org/10.1117/12.693039
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

An implementation of inverse lithography technology is studied with special attention to illustrating and analyzing the placement, accuracy, and efficacy of subresolution assist elements. One-dimensional placement through pitch is characterized, and 2D capability is demonstrated for repeated patterns. Differences between the methods of mask preparation afforded by this system as compared to current practices are described.

Citation Download Citation

Andrew Moore, Timothy Lin, Yong Liu, Gordon Russell, Linyong Pang, and Daniel Abrams "Inverse lithography technology at low k1: placement and accuracy of assist features", Proc. SPIE 6349, Photomask Technology 2006, 63494T (20 October 2006); https://doi.org/10.1117/12.693039

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