Process development, design, and characterization of high-finesse micromachined optical Fabry-Perot microcavities

Marcel W. Pruessner; Todd H. Stievater; William S. Rabinovich

doi:10.1117/12.705901

12 February 2007 Process development, design, and characterization of high-finesse micromachined optical Fabry-Perot microcavities

Marcel W. Pruessner, Todd H. Stievater, William S. Rabinovich

Author Affiliations +

Proceedings Volume 6464, MEMS/MOEMS Components and Their Applications IV; 64640N (2007) https://doi.org/10.1117/12.705901
Event: MOEMS-MEMS 2007 Micro and Nanofabrication, 2007, San Jose, California, United States

Abstract

Micromachined waveguide Fabry-Perot cavities are demonstrated. The devices are fabricated in silicon-on-insulator using a cryogenic dry-etch process, enabling large aspect ratios with high verticality and low surface roughness (⩽10 nm). Details of the process development are presented with emphasis on our specific device application. The Fabry-Perot cavities consist of shallow-etched rib waveguides and deep-etched silicon/air distributed Bragg reflector (DBR) mirrors. The high-index-contrast mirrors enable large reflectance with only a few mirror periods. High Q-factor (Q≈27,000) and large finesse (F≈500) were measured. We demonstrate thermo-optic tuning over &Dgr;&lgr;=6.7 nm and also examine modulation of the cavity (f=150 kHz). Future improvements and application areas of this device are discussed.

Citation Download Citation

Marcel W. Pruessner, Todd H. Stievater, and William S. Rabinovich "Process development, design, and characterization of high-finesse micromachined optical Fabry-Perot microcavities", Proc. SPIE 6464, MEMS/MOEMS Components and Their Applications IV, 64640N (12 February 2007); https://doi.org/10.1117/12.705901

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KEYWORDS

Silicon

Mirrors

Fabry–Perot interferometers

Etching

Waveguides

Modulation

Reflectivity

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