Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography

Chandra Saru Saravanan; Srinivasan Nirmalgandhi; Oleg Kritsun; Alden Acheta; Richard Sandberg; Bruno La Fontaine; Harry J. Levinson; Kevin Lensing; Mircea Dusa; Jan Hauschild; Anita Pici

doi:10.1117/12.712470

4 April 2007 Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography

Chandra Saru Saravanan, Srinivasan Nirmalgandhi, Oleg Kritsun, Alden Acheta, Richard Sandberg, Bruno La Fontaine, Harry J. Levinson, Kevin Lensing, Mircea Dusa, Jan Hauschild, Anita Pici

Author Affiliations +

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 651806 (2007) https://doi.org/10.1117/12.712470
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

This paper discusses the use of scatterometry for scanner focus control in hyper-NA lithography. A variety of techniques based on phase shift technology have been traditionally used to monitor scanner focus. Recently scatterometry has offered significant promise as an alternate technique to monitor both focus and dose. In this study, we make careful comparisons of a Scatterometry-based Focus-Dose Monitoring (SFDM) technique to Phase-grating Focus Monitoring (PGFM). We discuss the operating principles of these techniques and compare the sensitivity of SFDM to PGFM. In addition, the variation observed in characterizing intra-field and across-wafer behavior of a hyper-NA immersion scanner is described when using these different techniques.

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Chandra Saru Saravanan, Srinivasan Nirmalgandhi, Oleg Kritsun, Alden Acheta, Richard Sandberg, Bruno La Fontaine, Harry J. Levinson, Kevin Lensing, Mircea Dusa, Jan Hauschild, and Anita Pici "Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651806 (4 April 2007); https://doi.org/10.1117/12.712470

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