The accuracy of a calibrated PROLITH physical resist model across illumination conditions

John J. Biafore; Stewart A. Robertson; Mark D. Smith; Chris Sallee

doi:10.1117/12.712862

21 March 2007 The accuracy of a calibrated PROLITH physical resist model across illumination conditions

John J. Biafore, Stewart A. Robertson, Mark D. Smith, Chris Sallee

Proceedings Volume 6521, Design for Manufacturability through Design-Process Integration; 65211I (2007) https://doi.org/10.1117/12.712862
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

In this paper, the portability of a calibrated PROLITH resist model outside of the exposure conditions used during its generation is tested. Can a single physical resist model accurately predict results of different illumination schemes without recalibration at each condition? Can a calibrated physical resist model accurately describe observed lithographic behaviors outside the conditions used to create it? PROLITH model accuracy in predicting verification data exposed at conditions different from the calibration condition is shown to be 1 nm RMS across dose, focus and mask pitch.

Citation Download Citation

John J. Biafore, Stewart A. Robertson, Mark D. Smith, and Chris Sallee "The accuracy of a calibrated PROLITH physical resist model across illumination conditions", Proc. SPIE 6521, Design for Manufacturability through Design-Process Integration, 65211I (21 March 2007); https://doi.org/10.1117/12.712862

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