Optics development for Japanese XFEL project

Makina Yabashi; Atsushi Higashiya; Kenji Tamasaku; Hiroaki Kimura; Togo Kudo; Haruhiko Ohashi; Sunao Takahashi; Shunji Goto; Tetsuya Ishikawa

doi:10.1117/12.724318

18 May 2007 Optics development for Japanese XFEL project

Makina Yabashi, Atsushi Higashiya, Kenji Tamasaku, Hiroaki Kimura, Togo Kudo, Haruhiko Ohashi, Sunao Takahashi, Shunji Goto, Tetsuya Ishikawa

Author Affiliations +

Proceedings Volume 6586, Damage to VUV, EUV, and X-ray Optics; 658605 (2007) https://doi.org/10.1117/12.724318
Event: International Congress on Optics and Optoelectronics, 2007, Prague, Czech Republic

Abstract

X-ray free-electron laser (XFEL) is being constructed at the SPring-8 site by RIKEN and JASRI. The basic configuration of the XFEL beamline is similar to the design of a standard x-ray undulator beamline. Qualities of the optical components such as a diamond crystals, a beryllium window, and a mirror have been improved for XFEL applications. From the doses evaluation of the optical components and the availability, the guideline for the detailed design is presented.

Citation Download Citation

Makina Yabashi, Atsushi Higashiya, Kenji Tamasaku, Hiroaki Kimura, Togo Kudo, Haruhiko Ohashi, Sunao Takahashi, Shunji Goto, and Tetsuya Ishikawa "Optics development for Japanese XFEL project", Proc. SPIE 6586, Damage to VUV, EUV, and X-ray Optics, 658605 (18 May 2007); https://doi.org/10.1117/12.724318

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