Two-dimensional MEMS array for maskless lithography and wavefront modulation

D. López; V. A. Aksyuk; G. P. Watson; W. M. Mansfield; R. Cirelli; F. Klemens; F. Pardo; E. Ferry; J. Miner; T. W. Sorsch; M. Peabody; J. Bower; C. S. Pai; J. Gates

doi:10.1117/12.724467

15 May 2007 Two-dimensional MEMS array for maskless lithography and wavefront modulation

D. López, V. A. Aksyuk, G. P. Watson, W. M. Mansfield, R. Cirelli, F. Klemens, F. Pardo, E. Ferry, J. Miner, T. W. Sorsch, M. Peabody, J. Bower, C. S. Pai, J. Gates

Author Affiliations +

Proceedings Volume 6589, Smart Sensors, Actuators, and MEMS III; 65890S (2007) https://doi.org/10.1117/12.724467
Event: Microtechnologies for the New Millennium, 2007, Maspalomas, Gran Canaria, Spain

Abstract

We review the fabrication process of a recently introduced phase only MEMS based spatial light modulators for maskless lithography. A brief description of this device is presented. The physical properties of its structural layers and the difficulties encountered during its fabrication process are described in detail.

Citation Download Citation

D. López, V. A. Aksyuk, G. P. Watson, W. M. Mansfield, R. Cirelli, F. Klemens, F. Pardo, E. Ferry, J. Miner, T. W. Sorsch, M. Peabody, J. Bower, C. S. Pai, and J. Gates "Two-dimensional MEMS array for maskless lithography and wavefront modulation", Proc. SPIE 6589, Smart Sensors, Actuators, and MEMS III, 65890S (15 May 2007); https://doi.org/10.1117/12.724467

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