Performance enhancement of ion beam sputtered oxide coatings for 193 nm

H. Blaschke; M. Lappschies; D. Ristau

doi:10.1117/12.752908

20 December 2007 Performance enhancement of ion beam sputtered oxide coatings for 193 nm

H. Blaschke, M. Lappschies, D. Ristau

Proceedings Volume 6720, Laser-Induced Damage in Optical Materials: 2007; 67200T (2007) https://doi.org/10.1117/12.752908
Event: Boulder Damage Symposium XXXIX: Annual Symposium on Optical Materials for High Power Lasers, 2007, Boulder, Colorado, United States

Abstract

The utilization of oxide mixtures as layer material for coating design has been transferred to the ion beam sputtering technology and was applied to high-reflecting as well as anti-reflecting components at the wavelength of 193nm. Exclusively, the oxides SiO₂ and Al₂O₃ are candidates for appropriate thin film designs below 200nm. Experimental data received from laser-calorimetric measurements, spectroscopic investigations and laser-induced damage tests are presented for several specimens. With respect to state-of-the-art thin film deposition in the DUV spectral range, conventional quarterwave designs have also been characterized and will be compared to the sputtered mixed oxide coatings.

Citation Download Citation

H. Blaschke, M. Lappschies, and D. Ristau "Performance enhancement of ion beam sputtered oxide coatings for 193 nm", Proc. SPIE 6720, Laser-Induced Damage in Optical Materials: 2007, 67200T (20 December 2007); https://doi.org/10.1117/12.752908

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