Mr. Holger B. H. Blaschke Profile

Holger B. H. Blaschke

at JENOPTIK Optical Systems GmbH

SPIE Involvement:

Author

Publications (38)

Proceedings Article | 6 December 2011 Paper

Excimer mirror thin film laser damage competition

Heinrich Mädebach, Detlev Ristau, Christopher Stolz, Lars Jensen, Holger Blaschke

Proceedings Volume 8190, 819007 (2011) https://doi.org/10.1117/12.899187

KEYWORDS: Mirrors, Laser induced damage, Resistance, Excimer lasers, Deposition processes, Excimers, Laser damage threshold, Silica, Ultraviolet radiation, Thin films

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Proceedings Article | 28 November 2011 Paper

Impact of SiO2 and CaF2 surface composition on the absolute absorption at 193nm

I. Balasa, L. Jensen, D. Ristau, H. Blaschke

Proceedings Volume 8190, 81901T (2011) https://doi.org/10.1117/12.900042

KEYWORDS: Absorption, Silica, Surface finishing, Extreme ultraviolet, Polishing, Lithography, Deep ultraviolet, Spectroscopy, Temperature metrology, Quartz

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Proceedings Article | 23 November 2011 Paper

Defect formation in oxide thin films

Lars Jensen, Frank Wagner, Detlev Ristau, Céline Gouldieff, Mathias Mende, Holger Blaschke, Jean-Yves Natoli

Proceedings Volume 8190, 81900D (2011) https://doi.org/10.1117/12.899113

KEYWORDS: Silica, Oxides, Laser induced damage, Ultraviolet radiation, Laser damage threshold, Thin films, Data modeling, Thin film coatings, Ion beams, Data acquisition

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Proceedings Article | 4 October 2011 Paper

Laser-induced damage of pure and mixture material high reflectors for 355nm and 1064nm wavelength

Detlev Ristau, Werner Riggers, Lars Jensen, Holger Blaschke, Mathias Mende, Henrik Ehlers

Proceedings Volume 8168, 816821 (2011) https://doi.org/10.1117/12.897049

KEYWORDS: Reflectors, Silica, Multilayers, Refractive index, Absorption, Laser induced damage, Transmission electron microscopy, Ion beams, Hybrid fiber optics, Optical coatings

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High reflecting multilayer coatings play a key role for many applications of pulsed Nd:YAG high power lasers in industry and science. In the present contribution, improvements in the optical properties and the radiation resistance of high reflectors for 355nm and 1064nm wavelength on the basis of mixture materials are discussed. Within a co-operation between the LASEROPTIK GmbH and the Laser Zentrum Hannover e.V., several deposition processes including Ion Beam Sputtering, Magnetron Sputtering, and Electron Beam Evaporation could be addressed for this study. The selected material combinations HfO₂+ZrO₂/SiO₂, HfO₂+Al₂O₃/SiO₂, HfO₂+SiO₂/SiO₂ and HfO₂/SiO₂ were deposited using a zone target assembly for the IBS technique or defined material mixtures for the evaporation process. Single layers of the applied mixtures were analyzed by UV/Vis/NIR spectroscopy to correlate the optical constants with the atomic compositions quantified by Energy Dispersive X-ray Spectroscopy (EDX) and X-ray Photoelectron Spectroscopy (XPS). In addition to pure material reference mirrors and reflecting multilayer coatings with high index material mixtures, also interference coatings consisting of nanolaminates as well as multilayer systems with refractive index profiles were produced. The laser induced damage thresholds at 1064nm wavelength for nanosecond pulse durations were measured in a 1000on1 experiment complying with the standard ISO11254. For the 355nm high reflectors, the radiation resistance was determined in a 10000on1 procedure, furthermore, the radiation-induced absorption was measured by laser calorimetry according to ISO11551. Finally, the layer interfaces and the amorphous microstructure of selected multilayers were analyzed by Transmission Electron Microscopy (TEM) to obtain detailed information about possible partial crystallinity. The results are interpreted in the context of former investigations on the power handling capability of coating systems involving material mixtures.

Proceedings Article | 8 April 2011 Paper

Broadband spectrophotometry on nonplanar EUV multilayer optics

D. Ristau, H. Blaschke, I. Balasa

Proceedings Volume 7969, 796928 (2011) https://doi.org/10.1117/12.881577

KEYWORDS: Reflectivity, Spectral resolution, Spectrographs, Mirrors, Extreme ultraviolet, CCD cameras, Silicon, Optical components, Spectroscopy, Spectrophotometry

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Proceedings Article | 7 December 2010 Paper

Exposure of high-reflecting fluoride coatings under high fluence conditions at 193nm

W. Riggers, D. Ristau, H. Blaschke

Proceedings Volume 7842, 78420I (2010) https://doi.org/10.1117/12.867257

KEYWORDS: Multilayers, Mirrors, Fluorine, Ultraviolet radiation, Laser damage threshold, Reflectors, Silica, Vacuum ultraviolet, Laser induced damage, Optical coatings

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Proceedings Article | 1 December 2010 Paper

Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses

Mathias Mende, Lars Jensen, Wolfgang Rudolph, Detlev Ristau, Luke Emmert, Duy Nguyen, Holger Blaschke

Proceedings Volume 7842, 784207 (2010) https://doi.org/10.1117/12.867238

KEYWORDS: Composites, Laser damage threshold, Laser induced damage, Silica, Femtosecond phenomena, Optical coatings, Reflectors, Refraction, Absorption, Mirrors

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Proceedings Article | 31 December 2009 Paper

Thin film femtosecond laser damage competition

Christopher Stolz, Detlev Ristau, Marcus Turowski, Holger Blaschke

Proceedings Volume 7504, 75040S (2009) https://doi.org/10.1117/12.837473

KEYWORDS: Resistance, Thin films, Femtosecond phenomena, Reflectivity, Pulsed laser operation, Thin film coatings, Deposition processes, Laser damage threshold, Optical coatings, Silica

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Proceedings Article | 31 December 2009 Paper

Spot-size dependence of the LIDT from the NIR to the UV

M. Jupé, S. Schrameyer, L. Jensen, H. Blaschke, D. Ristau

Proceedings Volume 7504, 75041E (2009) https://doi.org/10.1117/12.836066

KEYWORDS: Laser damage threshold, Coating, Ultraviolet radiation, Reflectors, Nd:YAG lasers, Near infrared, Laser induced damage, Thin films, Standards development, Silica

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Proceedings Article | 18 May 2009 Paper

XUV metrology: surface analysis with extreme ultraviolet radiation

M. Banyay, K. Mann, T. Bücker, C. Peth, I. Balasa, F. Barkusky, A. Bayer, H. Blaschke, L. Juschkin, P. Loosen, S. Döring, D. Ristau

Proceedings Volume 7361, 736113 (2009) https://doi.org/10.1117/12.833648

KEYWORDS: Extreme ultraviolet, Reflectivity, Carbon, Silicon, Reflectometry, Sensors, Absorption, Metrology, Plasmas, Mirrors

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Proceedings Article | 22 April 2009 Paper

Long term tests of resonator optics in ArF excimer lasers

Norbert Kaiser, Holger Blaschke, Henrik Ehlers, Dieter Gäbler, Nils Beermann, Martin Bischoff, Ansgar Matern, Detlev Ristau, Dirk Wulff-Molder, Sigrid Jukresch

Proceedings Volume 7131, 713117 (2009) https://doi.org/10.1117/12.816706

KEYWORDS: Resonators, Reflectors, Contamination, Excimer lasers, Laser optics, Optical coatings, Crystals, Interfaces, Laser resonators, Mirrors

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Proceedings Article | 30 December 2008 Paper

Influence of pre-treatment conditions on the resistivity of fluoride multilayers

D. Ristau, H. Blaschke, S. Schippel, W. Riggers

Proceedings Volume 7132, 71320I (2008) https://doi.org/10.1117/12.804463

KEYWORDS: Ultraviolet radiation, Absorption, Multilayers, Contamination, Spectroscopy, Optical coatings, Optical testing, Nitrogen, Atmospheric optics, FT-IR spectroscopy

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Proceedings Article | 30 December 2008 Paper

Investigation in the degradation of CaF2 outcouplers in excimer lasers operating at 193nm

M. Bischoff, N. Kaiser, H. Blaschke, D. Gäbler, D. Wulff-Molder, A. Matern, H. Ehlers, D. Ristau, N. Beermann

Proceedings Volume 7132, 71321A (2008) https://doi.org/10.1117/12.804428

KEYWORDS: Excimer lasers, Coating, Reflectors, Transmittance, Crystals, Ions, Interfaces, Electron microscopy, Reflectivity, Carbonates

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Proceedings Article | 16 April 2008 Paper

Optics characterization with compact EUV spectrophotometer

R. Lebert, K. Mann, A. Bayer, L. Koch, D. Ristau, F. Barkusky, H. Blaschke, K. Starke, I. Balasa, C. Wies

Proceedings Volume 6922, 692228 (2008) https://doi.org/10.1117/12.772859

KEYWORDS: Extreme ultraviolet, Spectrophotometry, EUV optics, Spectroscopy, Reflectivity, Inspection, Process control, Optical lithography, Geometrical optics, Charge-coupled devices

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Proceedings Article | 20 December 2007 Paper

Performance enhancement of ion beam sputtered oxide coatings for 193 nm

D. Ristau, H. Blaschke, M. Lappschies

Proceedings Volume 6720, 67200T (2007) https://doi.org/10.1117/12.752908

KEYWORDS: Oxides, Refractive index, Optical coatings, Absorption, Silica, Ion beams, Multilayers, Sputter deposition, Laser damage threshold, Spectroscopy

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Proceedings Article | 15 January 2007 Paper

Laser resistivity of selected multilayer designs for DUV/VUV applications

H. Blaschke, St. Günster, D. Ristau

Proceedings Volume 6403, 640318 (2007) https://doi.org/10.1117/12.696241

KEYWORDS: Mirrors, Oxides, Absorption, Free electron lasers, Deep ultraviolet, Coating, Vacuum ultraviolet, Transmittance, Laser applications, Laser induced damage

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Proceedings Article | 29 August 2006 Paper

Novel compact spectrophotometer for EUV-optics characterization

S. Nevas, L. Jensen, D. Ristau, K. Starke, H. Blaschke, K. Mann, C. Wies, R. Lebert, A. Bayer, F. Barkusky

Proceedings Volume 6317, 631701 (2006) https://doi.org/10.1117/12.686878

KEYWORDS: Reflectivity, Spectroscopy, Transmittance, Spectrophotometry, CCD cameras, Silicon, Optical components, Spectral resolution, Gold, Calibration

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Proceedings Article | 20 October 2005 Paper

Modern topics in standardized laser-induced damage threshold measurements

M. Jupé, K. Starke, H. Blaschke, D. Ristau, M. Lappschies

Proceedings Volume 5965, 59650D (2005) https://doi.org/10.1117/12.629055

KEYWORDS: Laser damage threshold, Standards development, Laser induced damage, Coating, Laser systems engineering, Pulsed laser operation, Mirrors, Optical coatings, Refractive index, Absorption

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Proceedings Article | 10 June 2004 Paper

Surface investigation of VUV-optical components after exposure to high-energy synchrotron radiation

Holger Blaschke, Kai Starke, Miltcho Danailov, B. Diviacco, Alexandre Gatto, Francesca Sarto, Stefan Guenster, Enrico Massetti, Norbert Kaiser, Detlev Ristau

Proceedings Volume 5273, (2004) https://doi.org/10.1117/12.525490

KEYWORDS: Transmittance, Vacuum ultraviolet, Oxides, Synchrotron radiation, Optical coatings, Aluminum, Lanthanum, Resistance, Visible radiation, Microscopy

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Proceedings Article | 25 February 2004 Paper

Radiation resistance of single- and multilayer coatings against synchrotron radiation

F. Menchini, Norbert Kaiser, Stefan Guenster, Mauro Trovo, Miltcho Danailov, Francesca Sarto, Holger Blaschke, Detlev Ristau, Alexandre Gatto, Daniel Flori

Proceedings Volume 5250, (2004) https://doi.org/10.1117/12.514801

KEYWORDS: Optical coatings, Vacuum ultraviolet, Transmittance, Multilayers, Oxides, Mirrors, Reflectivity, Free electron lasers, Absorption, Synchrotron radiation

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Proceedings Article | 30 May 2003 Paper

Absorptance measurements for the DUV spectral range by laser calorimetry

Detlev Ristau, Marco Jupe, Holger Blaschke

Proceedings Volume 4932, (2003) https://doi.org/10.1117/12.472385

KEYWORDS: Luminescence, Absorption, Deep ultraviolet, Calibration, Excimer lasers, Quartz, Calorimetry, Optical components, Optical calibration, Signal detection

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Proceedings Article | 30 May 2003 Paper

DUV/VUV spectrophotometry for high-precision spectral characterization

Jürgen Kohlhaas, Detlev Ristau, Puja Kadkhoda, Holger Blaschke

Proceedings Volume 4932, (2003) https://doi.org/10.1117/12.472387

KEYWORDS: Transmittance, Reflectivity, Lamps, Calibration, Signal detection, Optical components, Spectrophotometry, Mirrors, Signal to noise ratio, Laser scattering

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Proceedings Article | 30 May 2003 Paper

Radiation resistance of optical materials against synchrotron radiation

Joerg Heber, Francesca Sarto, Detlev Ristau, Enrico Masetti, Norbert Kaiser, Stefan Guenster, Salvatore Scaglione, B. Diviacco, Holger Blaschke, Marino Marsi, Alexandre Gatto, Mauro Trovo

Proceedings Volume 4932, (2003) https://doi.org/10.1117/12.473160

KEYWORDS: Vacuum ultraviolet, Synchrotron radiation, Surface finishing, Free electron lasers, Synchrotrons, Resistance, Transmittance, Polishing, Hard x-rays, Reflectivity

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Proceedings Article | 9 April 2002 Paper

Dynamic absorptance behavior of hybrid multilayers at 193 nm

Marco Jupe, E. Welsch, Detlev Ristau, S. Bock, S. Martin, Holger Blaschke

Proceedings Volume 4679, (2002) https://doi.org/10.1117/12.461688

KEYWORDS: Reflectivity, Metals, Multilayers, Aluminum, Optical coatings, Excimer lasers, Dielectrics, Calorimetry, Calibration, Laser induced damage

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Proceedings Article | 12 April 2001 Paper

Optical measurement of UV absorption in dielectric coatings

S. Bock, Holger Blaschke, Eberhard Welsch, S. Martin

Proceedings Volume 4347, (2001) https://doi.org/10.1117/12.425060

KEYWORDS: Absorption, Quartz, Optical coatings, Ultraviolet radiation, Optical testing, Transient nonlinear optics, Reflectivity, Dielectrics, Pulsed laser operation, Laser induced damage

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Proceedings Article | 12 April 2001 Paper

Absolute measurements of nonlinear absorption near LIDT at 193 nm

Oliver Apel, Eberhard Welsch, Holger Blaschke, Detlev Ristau

Proceedings Volume 4347, (2001) https://doi.org/10.1117/12.425057

KEYWORDS: Absorption, Thin film coatings, Oxides, Ultraviolet radiation, Sputter deposition, Laser induced damage, Optical coatings, Information operations, Calorimetry, Thin films

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Proceedings Article | 2 November 2000 Paper

Investigations of transmittance and reflectance in the DUV/VUV spectral range

Puja Kadkhoda, Detlev Ristau, Holger Blaschke, J. Kohlhaas

Proceedings Volume 4099, (2000) https://doi.org/10.1117/12.405831

KEYWORDS: Reflectivity, Transmittance, Standards development, Vacuum ultraviolet, Scattering, Sensors, Photometry, Spectrophotometry, Deep ultraviolet, Optical components

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Proceedings Article | 3 March 2000 Paper

Thickness dependence of damage thresholds for 193-nm dielectric mirrors by predamage sensitive photothermal technique

Holger Blaschke, Sven Martin, Detlev Ristau, Bincheng Li, Eberhard Welsch, Winfried Arens

Proceedings Volume 3902, (2000) https://doi.org/10.1117/12.379306

KEYWORDS: Absorption, Laser damage threshold, Laser induced damage, Oxides, Optical coatings, Multilayers, Lithium, Ultraviolet radiation, Reflectivity, Dielectric mirrors

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Proceedings Article | 7 September 1999 Paper

Microstructure and radiation interactions of optical interference coatings for 193-nm applications

Holger Blaschke, A. Goertler, Uwe Leinhos, Roland Thielsch, Joerg Heber, Norbert Kaiser

Proceedings Volume 3738, (1999) https://doi.org/10.1117/12.360076

KEYWORDS: Optical coatings, Absorption, Thin film coatings, Atmospheric optics, Deep ultraviolet, Contamination, Thin films, Multilayers, Water, Laser induced damage

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Proceedings Article | 7 April 1999 Paper

Changes in optical interference coatings exposed to 193-nm excimer laser radiation

A. Goertler, Holger Blaschke, Uwe Leinhos, Roland Thielsch, Norbert Kaiser, Joerg Heber

Proceedings Volume 3578, (1999) https://doi.org/10.1117/12.344384

KEYWORDS: Absorption, Optical coatings, Thin film coatings, Color centers, Oxides, Mirrors, Reflection, Silica, Excimer lasers, Reflectivity

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Proceedings Article | 7 April 1999 Paper

Current status of radiation resistance of dielectric mirrors in the DUV

Hans Lauth, Roland Thielsch, Holger Blaschke, Helmut Bernitzki, Norbert Kaiser, Klaus Mann

Proceedings Volume 3578, (1999) https://doi.org/10.1117/12.344386

KEYWORDS: Mirrors, Resistance, Reflectivity, Dielectric mirrors, Oxides, Silica, Laser damage threshold, Deep ultraviolet, Laser induced damage, Mirror pointing

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Proceedings Article | 7 April 1999 Paper

Laser resistivity and causes of damage in coating materials for 193 nm by photothermal methods

Sven Martin, Joerg Heber, Holger Blaschke, Eberhard Welsch, Roland Thielsch, Norbert Kaiser

Proceedings Volume 3578, (1999) https://doi.org/10.1117/12.344383

KEYWORDS: Coating, Ultraviolet radiation, Silica, Laser damage threshold, Multilayers, Heat treatments, Oxides, Reflectivity, Optical coatings, Plasma

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Proceedings Article | 7 April 1999 Paper

Influence of thermal substrate properties on the damage threshold of UV coatings

Bincheng Li, Eberhard Welsch, Sven Martin, Holger Blaschke, Ch. Koenigsdoerffer, Roland Thielsch, M. Roth, Andreas Morak, Norbert Kaiser

Proceedings Volume 3578, (1999) https://doi.org/10.1117/12.344387

KEYWORDS: Laser damage threshold, Copper, Aluminum, Quartz, Thermal effects, Temperature metrology, Optical coatings, Ultraviolet coatings, Thin films, Pulsed laser operation

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Proceedings Article | 29 June 1998 Paper

Stability of optical interference coatings exposed to low-fluence 193-nm ArF radiation

Norbert Kaiser, Klaus Mann, Uwe Leinhos, Joerg Heber, Eric Eva, Roland Thielsch, Holger Blaschke, Andreas Goertler

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310734

KEYWORDS: Coating, Oxides, Absorption, Laser irradiation, Reflectivity, Reflection, Antireflective coatings, Multilayers, Radiation effects, Atmospheric optics

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SPIE Journal Paper | 1 February 1997

Investigation of the absorption induced damage in ultraviolet dielectric thin films

Eberhard Welsch, K. Ettrich, Holger Blaschke, Peter Thomsen-Schmidt, Dieter Schaefer, Norbert Kaiser

OE, Vol. 36, Issue 02, (February 1997) https://doi.org/10.1117/12.10.1117/1.601222

KEYWORDS: Absorption, Ultraviolet radiation, Laser damage threshold, Thin films, Coating, Laser beam diagnostics, Mirrors, Multilayers, Aluminum, Quartz

Proceedings Article | 27 May 1996 Paper

UV-laser investigation of dielectric thin films

Holger Blaschke, Dieter Schaefer, K. Ettrich, Peter Thomsen-Schmidt, Eberhard Welsch

Proceedings Volume 2714, (1996) https://doi.org/10.1117/12.240407

KEYWORDS: Laser damage threshold, Coating, Quartz, Laser beam diagnostics, Absorption, Ultraviolet radiation, Multilayers, Laser induced damage, Thin films, Dielectrics

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Proceedings Article | 14 July 1995 Paper

Damage precursor measurements on UV optical coatings

Holger Blaschke, K. Ettrich, Eberhard Welsch

Proceedings Volume 2428, (1995) https://doi.org/10.1117/12.213763

KEYWORDS: Optical coatings, Ultraviolet radiation, Multilayers, UV optics, Laser beam diagnostics, Thin films, Laser optics, Signal detection, Thin film coatings, Thermography

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Proceedings Article | 4 November 1994 Paper

Application of photothermal probe beam deflection technique for the high-sensitive characterization of optical thin films with respect to their optical, thermal, and thermoelastic inhomgeneities

W. Ziegler, M. Peters, Holger Blaschke, Michael Reichling, K. Ettrich, Axel Bodemann, Eberhard Welsch

Proceedings Volume 2253, (1994) https://doi.org/10.1117/12.192178

KEYWORDS: Thin films, Thermography, Laser beam diagnostics, Optical coatings, Ultraviolet radiation, Mirrors, Thin film coatings, Absorption, Magnesium fluoride, Multilayers

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Showing 5 of 38 publications

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