Dr. Uwe Leinhos Profile

Dr. Uwe Leinhos

Scientist at MicroLiquids GmbH

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Author

Publications (24)

Proceedings Article | 20 March 2018 Presentation

Characterization of absorptance and thermally induced wavefront deformations in DUV lithography optics (Conference Presentation)

Klaus Mann, Uwe Leinhos, Bernd Schäfer

Proceedings Volume 10587, 1058711 (2018) https://doi.org/10.1117/12.2300523

KEYWORDS: Wavefronts, Adaptive optics, Lithography, Absorption, Deep ultraviolet, Thermography, Wafer-level optics, Optical components, Wavefront sensors, Image resolution

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Proceedings Article | 21 November 2017 Paper

Quantitative absorption data from thermally induced wavefront distortions on UV, Vis, and NIR optics

Klaus Mann, Bernd Schäfer, Uwe Leinhos, Maik Lübbecke

Proceedings Volume 10447, 104471W (2017) https://doi.org/10.1117/12.2282366

KEYWORDS: Adaptive optics, Thermography, Laser beam diagnostics, Optical testing, Antireflective coatings

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Proceedings Article | 31 October 2014 Paper

Laser-induced damage tests under multiple wavelength irradiation of ATLID TXA optics for ESA-satellite mission EarthCare

Uwe Leinhos, Wilhelm Hüttner, Klaus Mann, Julian Sudradjat, Georgios Tzeremes

Proceedings Volume 9237, 92372G (2014) https://doi.org/10.1117/12.2074395

KEYWORDS: Ultraviolet radiation, Laser induced damage, Laser development, Reflectivity, Aerospace engineering, Mirrors, Optical testing, Nd:YAG lasers, Signal detection, Optical components

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Proceedings Article | 4 December 2012 Paper

Separation of different loss channels in DUV optical elements

Klaus Mann, Uwe Leinhos, Julian Sudradjat, Bernd Schäfer

Proceedings Volume 8530, 85301K (2012) https://doi.org/10.1117/12.977880

KEYWORDS: Absorption, Wavefronts, Silica, Deep ultraviolet, Thermal effects, Adaptive optics, Excimer lasers, Quartz, Optical components, Calibration

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Proceedings Article | 28 November 2011 Paper

Absolute measurement of absorptance in DUV optics from laser-induced wavefront deformations

K. Mann, U. Leinhos, J. Sudradjat, B. Schäfer

Proceedings Volume 8190, 81901S (2011) https://doi.org/10.1117/12.899503

KEYWORDS: Absorption, Wavefronts, Deep ultraviolet, Laser optics, Adaptive optics, Silica, Refractive index, Calibration, Collimation, Laser beam diagnostics

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Proceedings Article | 23 March 2011 Paper

Measurement of wavefront distortions in DUV optics due to lens heating

K. Mann, A. Bayer, U. Leinhos, M. Schöneck, B. Schäfer

Proceedings Volume 7973, 79732B (2011) https://doi.org/10.1117/12.879806

KEYWORDS: Absorption, Wavefronts, Deep ultraviolet, Silica, Wavefront distortions, Thermal effects, Sensors, Semiconductor lasers, Refractive index, Calibration

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Proceedings Article | 29 November 2010 Paper

Long-term laser induced contamination tests of optical elements under vacuum at 351nm

Uwe Leinhos, Klaus Mann, Armin Bayer, Jens-Oliver Dette, Matthias Schöneck, Martin Endemann, Denny Wernham, Federico Petazzi, Adrian Tighe, Jorge Alves, Dominique Thibault

Proceedings Volume 7842, 78422E (2010) https://doi.org/10.1117/12.869297

KEYWORDS: Contamination, Optical components, Autoregressive models, Luminescence, Doppler effect, Satellites, Excimer lasers, Laser applications, Optical testing, Sensors

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Proceedings Article | 8 September 2010 Paper

Long-term laser irradiation tests of optical elements for ESA mission ADM-Aeolus

Uwe Leinhos, Klaus Mann, Armin Bayer, Martin Endemann, Denny Wernham, Federico Pettazzi, Dominique Thibault

Proceedings Volume 7794, 779405 (2010) https://doi.org/10.1117/12.861163

KEYWORDS: Laser irradiation, Autoregressive models, Optical components, Doppler effect, Satellites, Luminescence, Excimer lasers, Optical testing, Contamination, Sensors

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Proceedings Article | 30 December 2008 Paper

Photothermal measurement of absorption and wavefront deformations in fused silica

K. Mann, A. Bayer, J. Gloger, U. Leinhos, T. Rousseau, B. Schäfer

Proceedings Volume 7132, 71321F (2008) https://doi.org/10.1117/12.804565

KEYWORDS: Absorption, Wavefronts, Silica, Quartz, Wavefront distortions, Thermal effects, Deep ultraviolet, Adaptive optics, Excimer lasers, Wavefront sensors

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Proceedings Article | 7 March 2008 Paper

A novel photo-thermal setup for determination of absorptance losses and wavefront deformations in DUV optics

K. Mann, A. Bayer, U. Leinhos, T. Miege, B. Schäfer

Proceedings Volume 6924, 69242P (2008) https://doi.org/10.1117/12.775453

KEYWORDS: Absorption, Wavefronts, Deep ultraviolet, Thermal effects, Wavefront distortions, Quartz, Adaptive optics, Silica, Refractive index, Calibration

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Proceedings Article | 14 February 2008 Paper

Characterization of absorptance losses in optical materials using a high resolution Hartmann-Shack wavefront sensor

A. Bayer, F. Barkusky, U. Leinhos, T. Miege, B. Schäfer, K. Mann

Proceedings Volume 6879, 68791S (2008) https://doi.org/10.1117/12.762579

KEYWORDS: Absorption, Wavefronts, Thermal effects, Wavefront distortions, Quartz, Wavefront sensors, Deep ultraviolet, Adaptive optics, Silica, Refractive index

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Proceedings Article | 18 December 2007 Paper

A novel photo-thermal setup for evaluation of absorptance losses and thermal wavefront deformations in DUV optics

K. Mann, A. Bayer, T. Miege, U. Leinhos, B. Schäfer

Proceedings Volume 6720, 67201B (2007) https://doi.org/10.1117/12.776945

KEYWORDS: Absorption, Wavefronts, Adaptive optics, Deep ultraviolet, Thermal effects, Wavefront distortions, Quartz, Thermography, Silica, Optical testing

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Proceedings Article | 15 January 2007 Paper

Characterization of absorption losses in deep UV optical materials

K. Mann, U. Leinhos, B. Schäfer

Proceedings Volume 6403, 64031J (2007) https://doi.org/10.1117/12.696123

KEYWORDS: Absorption, Crystals, Wavefronts, Deep ultraviolet, Excimer lasers, Thermal effects, Silica, Surface finishing, Surface roughness, Polishing

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Proceedings Article | 30 May 2003 Paper

Repetition rate dependence of two-photon absorption and self-trapped exciton luminescence in CaF2 at 193 nm

Christian Goerling, Uwe Leinhos, Klaus Mann

Proceedings Volume 4932, (2003) https://doi.org/10.1117/12.472376

KEYWORDS: Absorption, Luminescence, Solar thermal energy, Excitons, Crystals, Nonlinear crystals, Deep ultraviolet, Information operations, Fluorine, Signal detection

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Proceedings Article | 11 November 2002 Paper

Optical metrology in the VUV and EUV spectral range

Klaus Mann, Sebastian Kranzusch, G. Eckert, Christian Gorling, Uwe Leinhos, Christian Peth, Bernd Schafer

Proceedings Volume 4779, (2002) https://doi.org/10.1117/12.455923

KEYWORDS: Absorption, Fluorine, Photons, Vacuum ultraviolet, Laser induced fluorescence, Solar thermal energy, Thermal effects, Wavefront sensors, Optical metrology, Extreme ultraviolet

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Proceedings Article | 30 July 2002 Paper

Characterization of DUV and VUV optical components

Klaus Mann, G. Eckert, Christian Goerling, Uwe Leinhos, Bernd Schaefer

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474565

KEYWORDS: Absorption, Fluorine, Photons, Optical components, Vacuum ultraviolet, Laser induced fluorescence, Deep ultraviolet, Solar thermal energy, Thermal effects, Wavefront sensors

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Proceedings Article | 9 April 2002 Paper

Comparative studies of absorptance behavior and laser-induced fluorescene of alkaline-earth fluorides at 193 and 157 nm

Christian Goerling, Uwe Leinhos, Klaus Mann

Proceedings Volume 4679, (2002) https://doi.org/10.1117/12.461690

KEYWORDS: Absorption, Laser induced fluorescence, Fluorine, Photons, Vacuum ultraviolet, Luminescence, Excitons, Solar thermal energy, Deep ultraviolet, Pulsed laser operation

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Proceedings Article | 14 September 2001 Paper

Testing of optical components for microlithography at 193-nm and 157-nm

Klaus Mann, Oliver Apel, G. Eckert, Christian Goerling, Uwe Leinhos, Bernd Schaefer

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435671

KEYWORDS: Absorption, Silica, Excimer lasers, Optical components, Ultraviolet radiation, Vacuum ultraviolet, Wavefronts, Optical lithography, Deep ultraviolet, Optical testing

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Proceedings Article | 12 April 2001 Paper

CHARISMA: a new way for angular-resolved scattering measurements

Oliver Apel, Christian Goerling, Uwe Leinhos, Klaus Mann, Bernd Schaefer

Proceedings Volume 4347, (2001) https://doi.org/10.1117/12.425029

KEYWORDS: Scattering, Light scattering, Sensors, Scatter measurement, Laser scattering, Diffraction, Imaging systems, Reflectivity, Reflection, Calibration

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Proceedings Article | 12 April 2001 Paper

Interfacial absorption of DUV coatings

Oliver Apel, Michael Schulz-Grosser, Uwe Leinhos, Michael Kennedy, Klaus Mann, Rainer Schuhmann

Proceedings Volume 4347, (2001) https://doi.org/10.1117/12.425030

KEYWORDS: Absorption, Interfaces, Dielectrics, Optical coatings, Magnesium fluoride, Deep ultraviolet, Optical components, Silica, Oxides, Antireflective coatings

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Proceedings Article | 25 October 2000 Paper

Long-term test and characterization of optical components at 193 nm and 157 nm

Klaus Vogler, Ingo Klaft, Thomas Schroeder, Uwe Stamm, Klaus Mann, Oliver Apel, Christian Goerling, Uwe Leinhos

Proceedings Volume 4102, (2000) https://doi.org/10.1117/12.405292

KEYWORDS: Sensors, Optical components, Ultraviolet detectors, Signal detection, Excimer lasers, Mirrors, Absorption, Scattering, Laser irradiation, Nitrogen

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Proceedings Article | 7 September 1999 Paper

Microstructure and radiation interactions of optical interference coatings for 193-nm applications

Joerg Heber, Roland Thielsch, Holger Blaschke, Norbert Kaiser, Uwe Leinhos, A. Goertler

Proceedings Volume 3738, (1999) https://doi.org/10.1117/12.360076

KEYWORDS: Optical coatings, Absorption, Thin film coatings, Atmospheric optics, Deep ultraviolet, Contamination, Thin films, Multilayers, Water, Laser induced damage

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Proceedings Article | 7 April 1999 Paper

Changes in optical interference coatings exposed to 193-nm excimer laser radiation

Joerg Heber, Roland Thielsch, Holger Blaschke, Norbert Kaiser, Uwe Leinhos, A. Goertler

Proceedings Volume 3578, (1999) https://doi.org/10.1117/12.344384

KEYWORDS: Absorption, Optical coatings, Thin film coatings, Color centers, Oxides, Mirrors, Reflection, Silica, Excimer lasers, Reflectivity

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Proceedings Article | 29 June 1998 Paper

Stability of optical interference coatings exposed to low-fluence 193-nm ArF radiation

Joerg Heber, Roland Thielsch, Holger Blaschke, Norbert Kaiser, Klaus Mann, Eric Eva, Uwe Leinhos, Andreas Goertler

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310734

KEYWORDS: Coating, Oxides, Absorption, Laser irradiation, Reflectivity, Reflection, Antireflective coatings, Multilayers, Radiation effects, Atmospheric optics

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Showing 5 of 24 publications

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