Paper
7 April 1999 Influence of thermal substrate properties on the damage threshold of UV coatings
Holger Blaschke, Sven Martin, Andreas Morak, Ch. Koenigsdoerffer, M. Roth, Bincheng Li, Eberhard Welsch, Roland Thielsch, Norbert Kaiser
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Abstract
The thermal decay of surface temperature has been calculated and measured on Al2O3/SiO2 coatings by using photothermal technique near damage threshold fluence. It could be shown that under certain conditions the decay times (tau) has been found to be in the order of some microseconds. This fact gives no explanation of the measured decrease of threshold fluence in some cases for higher repetition rates and shot numbers on Al2O3/SiO2 and HfO2/SiO2 multilayers for (lambda) equals 248nm. Furthermore, it could not be found any influence of the substrate materials. Thus, other than thermal accumulation is responsible for the lowered damage threshold by increasing repetition rate. Additionally, performed calculations of the thermal decay using 20ns, 248nm laser excitation confirm the experimental results. Even in the case of Al2O3/SiO2 coatings on copper no effect of the substrate as a heat sink could be measured. For HfO2/SiO2 coatings the behavior is in accordance with the fact that the thermal conductivity of HfO2 films is markedly lowered compared to the bulk value.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Holger Blaschke, Sven Martin, Andreas Morak, Ch. Koenigsdoerffer, M. Roth, Bincheng Li, Eberhard Welsch, Roland Thielsch, and Norbert Kaiser "Influence of thermal substrate properties on the damage threshold of UV coatings", Proc. SPIE 3578, Laser-Induced Damage in Optical Materials: 1998, (7 April 1999); https://doi.org/10.1117/12.344387
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KEYWORDS
Laser damage threshold

Copper

Aluminum

Quartz

Thermal effects

Optical coatings

Temperature metrology

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