Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses

Lars O. Jensen; Mathias Mende; Holger Blaschke; Detlev Ristau; Duy Nguyen; Luke Emmert; Wolfgang Rudolph

doi:10.1117/12.867238

30 November 2010 Investigations on SiO₂/HfO₂ mixtures for nanosecond and femtosecond pulses

Lars O. Jensen, Mathias Mende, Holger Blaschke, Detlev Ristau, Duy Nguyen, Luke Emmert, Wolfgang Rudolph

Proceedings Volume 7842, Laser-Induced Damage in Optical Materials: 2010; 784207 (2010) https://doi.org/10.1117/12.867238
Event: Laser Damage Symposium XLII: Annual Symposium on Optical Materials for High Power Lasers, 2010, Boulder, Colorado, United States

Abstract

After several investigations in laser induced damage behavior of oxide mixtures of different compositions, also HfO₂ could be steplessly mixed with SiO₂. A study of SiO₂/HfO₂ IBS single layers and high reflectors is presented. Damage testing has been performed at 800nm and 355nm on an extensive set of single layers employing different mixture ratios of silica and hafnia. The analysis of the response of optical single layer coatings to femtosecond and nanosecond pulse exposure provides input for further coating designs, in particular for the optimization in respect to the damage threshold properties. A deeper understanding of the damage mechanisms is gained by comparing the ns and fs pulse results as a function of the mixing ratio.

Citation Download Citation

Lars O. Jensen, Mathias Mende, Holger Blaschke, Detlev Ristau, Duy Nguyen, Luke Emmert, and Wolfgang Rudolph "Investigations on SiO₂/HfO₂ mixtures for nanosecond and femtosecond pulses", Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 784207 (30 November 2010); https://doi.org/10.1117/12.867238

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