High-index immersion fluids enabling cost-effective single-exposure lithography for 32 nm half pitches

Roger H. French; Hoang V. Tran; Doug J. Adelman; Nyrissa S. Rogado; Mureo Kaku; Michael Mocella; Charles Y. Chen; Eric Hendrickx; Freida Van Roey; Adam S. Bernfeld; Rebekah A. Derryberry

doi:10.1117/12.772105

12 March 2008 High-index immersion fluids enabling cost-effective single-exposure lithography for 32 nm half pitches

Roger H. French, Hoang V. Tran, Doug J. Adelman, Nyrissa S. Rogado, Mureo Kaku, Michael Mocella, Charles Y. Chen, Eric Hendrickx, Freida Van Roey, Adam S. Bernfeld, Rebekah A. Derryberry

Author Affiliations +

Proceedings Volume 6924, Optical Microlithography XXI; 692417 (2008) https://doi.org/10.1117/12.772105
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

We have performed high-index immersion fluid studies to define the levels of both soluble and insoluble impurities present. These studies have also revealed the importance of process materials' purity in fluid contact. Fluid interactions with resist, leading to both surface and imaging defects, can be minimized by proper resist selection. Our Active Recycle Package technology can greatly extend the useful life of both the fluid itself, as well as the final lens element.

Citation Download Citation

Roger H. French, Hoang V. Tran, Doug J. Adelman, Nyrissa S. Rogado, Mureo Kaku, Michael Mocella, Charles Y. Chen, Eric Hendrickx, Freida Van Roey, Adam S. Bernfeld, and Rebekah A. Derryberry "High-index immersion fluids enabling cost-effective single-exposure lithography for 32 nm half pitches", Proc. SPIE 6924, Optical Microlithography XXI, 692417 (12 March 2008); https://doi.org/10.1117/12.772105

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