Photo system based on scanning electron microscope for IC chip inspection

Wei Liu; Jin Shen; Boxue Tan

doi:10.1117/12.805301

2 February 2009 Photo system based on scanning electron microscope for IC chip inspection

Wei Liu, Jin Shen, Boxue Tan

Proceedings Volume 7159, 2008 International Conference on Optical Instruments and Technology: MEMS/NEMS Technology and Applications; 715903 (2009) https://doi.org/10.1117/12.805301
Event: International Conference of Optical Instrument and Technology, 2008, Beijing, China

Abstract

To overcome shortcoming of traditional optical device, a photo system based on scanning electron microscope has been developed. The photo system is composed of built-in compact piezoelectric stage and electron-beam controller. The stage is made up of piezoelectric driver and grating encoder system. It can operate in vacuum and non-magnetic environments. The electron-beam controller includes controlling model, deflection model, image acquisition model and position error feedback model. Scanning field can be calibrated before scanning. The photo system can scan the IC chip which is wider than one scanning field quickly by using this nano-positioning stage. The position error can be compensated by the position error feedback model, so the stitching precision between neighborhood images is improved. Legible IC image is obtained by using this system.

Citation Download Citation

Wei Liu, Jin Shen, and Boxue Tan "Photo system based on scanning electron microscope for IC chip inspection", Proc. SPIE 7159, 2008 International Conference on Optical Instruments and Technology: MEMS/NEMS Technology and Applications, 715903 (2 February 2009); https://doi.org/10.1117/12.805301

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