Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films

L. A. Emmert; D. N. Nguyen; M. Mero; W. Rudolph; D. Ristau; K. Starke; M. Jupé; C. S. Menoni; D. Patel; E. Krous

doi:10.1117/12.836508

31 December 2009 Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films

L. A. Emmert, D. N. Nguyen, M. Mero, W. Rudolph, D. Ristau, K. Starke, M. Jupé, C. S. Menoni, D. Patel, E. Krous

Author Affiliations +

Proceedings Volume 7504, Laser-Induced Damage in Optical Materials: 2009; 75040P (2009) https://doi.org/10.1117/12.836508
Event: Laser Damage Symposium XLI: Annual Symposium on Optical Materials for High Power Lasers, 2009, Boulder, Colorado, United States

Abstract

In this contribution we will summarize the fundamental mechanisms that lead to subpicosecond laser damage in dielectric films, discuss the resulting scaling laws of single pulse (1-on-1) damage with respect to pulse duration and bandgap, of the multiple pulse (S-on-1) damage threshold as a function of pulse number, and compare these findings to recent experimental results.

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L. A. Emmert, D. N. Nguyen, M. Mero, W. Rudolph, D. Ristau, K. Starke, M. Jupé, C. S. Menoni, D. Patel, and E. Krous "Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films", Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 75040P (31 December 2009); https://doi.org/10.1117/12.836508

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