Measurement of thin film shape with a sinusoidal wavelength scanning interferometer using a white light source

Osami Sasaki; Hiroshi Ueno; Takamasa Suzuki

doi:10.1117/12.840190

20 November 2009 Measurement of thin film shape with a sinusoidal wavelength scanning interferometer using a white light source

Osami Sasaki, Hiroshi Ueno, Takamasa Suzuki

Author Affiliations +

Proceedings Volume 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems; 75110B (2009) https://doi.org/10.1117/12.840190
Event: International Conference on Optical Instrumentation and Technology, 2009, Shanghai, China

Abstract

A halogen lamp and an acousto-optic tunable filter are used to construct a sinusoidal wavelength-scanning interferometer with the scanning width of 210 nm. A linear wavelength-scanning with the scanning width of 220 nm is utilized to determine amplitudes of three different interference signals produced from multiple-reflection lights by front and rear surfaces of a thin film. Amplitudes of time-varying phases produced by a sinusoidal wavelength-scanning and constant phases in the interference signals are estimated by minimizing a difference between detected signals and theoretical ones. From the estimated values, the positions of the front and rear surface of the thin film with a thickness of about 460 nm are measured with an error less than 4 nm.

Citation Download Citation

Osami Sasaki, Hiroshi Ueno, and Takamasa Suzuki "Measurement of thin film shape with a sinusoidal wavelength scanning interferometer using a white light source", Proc. SPIE 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 75110B (20 November 2009); https://doi.org/10.1117/12.840190

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