Evaluation of 172-nm wavelength as a possible candidate for 22-nm and below

Jee-Hye You; Eun-Jin Kim; Hye-Keun Oh

doi:10.1117/12.837231

14 December 2009 Evaluation of 172-nm wavelength as a possible candidate for 22-nm and below

Jee-Hye You, Eun-Jin Kim, Hye-Keun Oh

Proceedings Volume 7520, Lithography Asia 2009; 75202U (2009) https://doi.org/10.1117/12.837231
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan

Abstract

The lithography industry has been working to extend 193 nm immersion with double patterning and complex computational lithographic techniques for 32 nm and below. Also extreme ultraviolet lithography (EUV) are used to make the 22 nm half-pitch and below. However, technical challenges remain to be addressed, as well as the high cost of the manufacturing tool. There was a report that a new wavelength, 172 or 175 nm, can be used for next generation lithography system. 172 nm lithography, although, has higher absorbance than 193 nm, it has much higher transmission than 157 nm in high refractive index liquid. Compared with 193 nm immersion lithography that has the resolution limit of 35.7 nm by using maximum numerical aperture (NA) of 1.35, 172 nm immersion lithography can be used for possible resolution limit of 27.4 nm by using maximum NA of 1.57. In this paper, we evaluated the 172 nm immersion lithography using commercial lithography simulation for 28 nm node by single exposure. We also checked the patterning possibility of 22 and 16 nm node by using 172 nm and double patterning because a totally new wavelength should show the possible extension to multiple generations.

Citation Download Citation

Jee-Hye You, Eun-Jin Kim, and Hye-Keun Oh "Evaluation of 172-nm wavelength as a possible candidate for 22-nm and below", Proc. SPIE 7520, Lithography Asia 2009, 75202U (14 December 2009); https://doi.org/10.1117/12.837231

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
7 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Lithography

Refractive index

Immersion lithography

Double patterning technology

Extreme ultraviolet lithography

Photomasks

Absorbance

Show All Keywords

Keywords/Phrases

Search In:

Publication Years