Resist pattern prediction at EUV

John J. Biafore; Mark D. Smith; Eelco van Setten; Tom Wallow; Patrick Naulleau; David Blankenship; Stewart A. Robertson; Yunfei Deng

doi:10.1117/12.846535

20 March 2010 Resist pattern prediction at EUV

John J. Biafore, Mark D. Smith, Eelco van Setten, Tom Wallow, Patrick Naulleau, David Blankenship, Stewart A. Robertson, Yunfei Deng

Author Affiliations +

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 76360R (2010) https://doi.org/10.1117/12.846535
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Accurate and flexible simulation methods may be used to further a researcher's understanding of how complex resist effects influence the patterning of critical structures. In this work, we attempt to gain insight into the behavior of a state-of-the-art EUV resist through the use of stochastic resist simulation. The statistics of photon and molecule counting are discussed. A discrete, probabilistic ionization and electron scattering simulator for acid generation at EUV is discussed. At EUV, acid generators are hypothesized to be activated by secondary electrons yielded by ionization of the resist upon absorption of photons. Model fit to experimental data of mean CD and LWR for a state-of-the-art EUV resist is shown.

Citation Download Citation

John J. Biafore, Mark D. Smith, Eelco van Setten, Tom Wallow, Patrick Naulleau, David Blankenship, Stewart A. Robertson, and Yunfei Deng "Resist pattern prediction at EUV", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76360R (20 March 2010); https://doi.org/10.1117/12.846535

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