EUV-multilayers on grating-like topographies

A. J. R. van den Boogaard; E. Louis; K. A. Goldberg; I. Mochi; F. Bijkerk

doi:10.1117/12.846564

22 March 2010 EUV-multilayers on grating-like topographies

A. J. R. van den Boogaard, E. Louis, K. A. Goldberg, I. Mochi, F. Bijkerk

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 76362S (2010) https://doi.org/10.1117/12.846564
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

In this study, multilayer morphology near the key anomalies in grating-like structures, namely sharp step-edges and steep walls, are examined. Different deposition schemes are employed. Based on cross section TEM analysis an explanatory model describing the morphology of the successive layers is developed. A further insight into the periodicity and the general performance of the multilayer is obtained by EUV microscopy. The main distortions in multilayer structure and hence EUV performance are found to be restricted to a region within a few hundred nanometers from the anomalies, which is very small compared to the proposed grating period (50-100 μm). These multilayer coated blazed gratings can thus be considered a viable option for spectral purity enhancement of EUV light sources.

Citation Download Citation

A. J. R. van den Boogaard, E. Louis, K. A. Goldberg, I. Mochi, and F. Bijkerk "EUV-multilayers on grating-like topographies", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362S (22 March 2010); https://doi.org/10.1117/12.846564

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