Paper
30 November 2010 Study of laser induced damage of high reflector at 1064 nm
Hongfei Jiao, Xinbin Cheng, Zhengxiang Shen, Bin Ma, Jinlong Zhang, Tao Ding, Pengfei He, Zhanshan Wang
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Abstract
One TiO2/SiO2 high reflector with absorption of 300 ppm and two HfO2/SiO2 high reflectors with absorption of 40 and 4.5 ppm were fabricated using electron beam evaporation method. The influence of average absorption on laser induced damage threshold (LIDT) at 1064 nm of these coatings was studied using r-on-1 test mode. The LIDT of high absorbing TiO2/SiO2 coating is only 6.2 J/cm2 at 3 ns, whereas, two weak absorbing HfO2/SiO2 high reflectors got almost the same LIDT that was over 100 J/cm2 at 3 ns. Then a raster scan test method was employed to find the typical damage morphologies of these coatings with different absorption level. For TiO2/SiO2 high reflector with high average absorption, the representative damage morphologies are shallow pits that were probably caused by absorbing centers. However, for HfO2/SiO2 high reflectors with low average absorption, the dominant damage morphologies are micrometer-sized nodules ejected pits and the delamination initiating from the pits. The absorption of HfO2/SiO2 coatings is low enough to have minor influence on the laser induced damage.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hongfei Jiao, Xinbin Cheng, Zhengxiang Shen, Bin Ma, Jinlong Zhang, Tao Ding, Pengfei He, and Zhanshan Wang "Study of laser induced damage of high reflector at 1064 nm", Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 784205 (30 November 2010); https://doi.org/10.1117/12.867241
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Cited by 2 scholarly publications.
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KEYWORDS
Reflectors

Absorption

Laser induced damage

Laser damage threshold

Raster graphics

Surface roughness

Atomic force microscopy

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