Paper
24 January 2011 Effect of the oxide-semiconductor interface on the passivation of hybrid type-II superlattice long-wave infrared photodiodes
Jill A. Nolde, Rory Stine, Eric M. Jackson, Chadwick L. Canedy, Igor Vurgaftman, Serguei I. Maximenko, Chaffra A. Affouda, Maria Gonzalez, Edward H. Aifer, Jerry R. Meyer
Author Affiliations +
Abstract
In order to be commercially viable, the type-II superlattice (T2SL) LWIR focal plane array technology will require the development of effective passivation of exposed surfaces. Here we investigate the relationship between the thickness and composition of the native oxide at the T2SL-SiO2 interface and the diode performance in terms of sidewall resistivity. Device performance is compared between samples with untreated surfaces, those for which the native oxides have been removed at various intervals prior to SiO2 deposition, and samples for which oxide growth was promoted by ozone exposure with and without a prior oxide strip. InAs- and GaSb-capped pieces were processed in an identical manner and studied using X-ray photoelectron spectroscopy (XPS). From these spectra, the compositions and thicknesses of the surface oxides just prior to SiO2 deposition were determined, complementing the electrical characterization of devices. Correlation of the performance and surface composition is presented.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jill A. Nolde, Rory Stine, Eric M. Jackson, Chadwick L. Canedy, Igor Vurgaftman, Serguei I. Maximenko, Chaffra A. Affouda, Maria Gonzalez, Edward H. Aifer, and Jerry R. Meyer "Effect of the oxide-semiconductor interface on the passivation of hybrid type-II superlattice long-wave infrared photodiodes", Proc. SPIE 7945, Quantum Sensing and Nanophotonic Devices VIII, 79451Y (24 January 2011); https://doi.org/10.1117/12.876320
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Cited by 3 scholarly publications.
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KEYWORDS
Oxides

Ozone

Etching

Superlattices

Interfaces

Silica

Gallium

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