Characterization of a 'thermal freeze' litho-litho-etch (LLE) process for predictive simulation

Stewart A. Robertson; Patrick Wong; John J. Biafore; Mark D. Smith; Nadia Vandenbroeck; Vincent Wiaux

doi:10.1117/12.879508

22 March 2011 Characterization of a 'thermal freeze' litho-litho-etch (LLE) process for predictive simulation

Stewart A. Robertson, Patrick Wong, John J. Biafore, Mark D. Smith, Nadia Vandenbroeck, Vincent Wiaux

Proceedings Volume 7973, Optical Microlithography XXIV; 79730L (2011) https://doi.org/10.1117/12.879508
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

In this work, a physical model is constructed to describe a thermal cure double patterning photoresist process. The basic lithographic response of each photoresist can be accurately described using the conventional chemically amplified resist modeling approach. Experimental data reveals that although the thermal cure process removes all detectable photosensitivity from the imaged first resist, it does increase the materials solubility in the second resist development process. It is theorized that this solubility change results from thermal de-protection of the resist polymer during the cure. Introduction of a first-order thermal de-protection process to the model, results in simulations that match the experimental data. Measurement of actinic optical properties show that the first resist remains optically stable during its processing (in the regions remaining on the wafer after development) but that the BARC material undergoes significant optical changes in open areas where the first resist has been removed. The calibrated process model is tested against experimental data generated under other optical conditions; good quantitative and qualitative agreement is observed and in one case the simulation results suggest a plausible mechanism for observed process failure.

Citation Download Citation

Stewart A. Robertson, Patrick Wong, John J. Biafore, Mark D. Smith, Nadia Vandenbroeck, and Vincent Wiaux "Characterization of a 'thermal freeze' litho-litho-etch (LLE) process for predictive simulation", Proc. SPIE 7973, Optical Microlithography XXIV, 79730L (22 March 2011); https://doi.org/10.1117/12.879508

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