Wavelength selection for multilayer coatings for the lithography generation beyond EUVL

Igor A. Makhotkin; Erwin Zoethout; Eric Louis; Andrei M. Yakunin; Stephan Müllender; Fred Bijkerk

doi:10.1117/12.918036

22 March 2012 Wavelength selection for multilayer coatings for the lithography generation beyond EUVL

Igor A. Makhotkin, Erwin Zoethout, Eric Louis, Andrei M. Yakunin, Stephan Müllender, Fred Bijkerk

Proceedings Volume 8322, Extreme Ultraviolet (EUV) Lithography III; 832213 (2012) https://doi.org/10.1117/12.918036
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

The spectral properties of LaN/B and LaN/B₄C multilayer mirrors have been investigated in the 6.5-6.9 nm wavelength range, based on measured B and B4C optical constants. We show that the wavelength of optimal single mirror reflectance for boron based optics is between 6.63 and 6.65 nm, depending on the boron chemical state. The wavelength of the maximum reflectance of the LaN/B₄C multilayer system is confirmed experimentally. Calculations of the wavelengthintegrated reflectance for ideal 10-multilayer-mirror stacks show that a B-based optical column can be optimized for a wavelength larger than 6.65 nm.

Citation Download Citation

Igor A. Makhotkin, Erwin Zoethout, Eric Louis, Andrei M. Yakunin, Stephan Müllender, and Fred Bijkerk "Wavelength selection for multilayer coatings for the lithography generation beyond EUVL", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 832213 (22 March 2012); https://doi.org/10.1117/12.918036

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