In collaboration with mask suppliers for change management enhancement

Erwin Deng; Chun Der Lee; Rachel Lee

doi:10.1117/12.2028296

28 June 2013 In collaboration with mask suppliers for change management enhancement

Erwin Deng, Chun Der Lee, Rachel Lee

Proceedings Volume 8701, Photomask and Next-Generation Lithography Mask Technology XX; 87010K (2013) https://doi.org/10.1117/12.2028296
Event: Photomask and NGL Mask Technology XX, 2013, Yokohama, Japan

Abstract

For those wafer fabs that have no their own maskshops, the main target of mask quality department is to gain stable mask quality performance through effective supplier management, and therefore achieves competitive business results. After dealing with lots of mask data preparation (MDP) quality problems with suppliers, we have found that incomplete change management procedures are one of major sources that induce incorrect mask data for writing. This article will share our experience in how to enhance change management flows with mask suppliers together and will also show the utility after a series of flow improvement actions.

Citation Download Citation

Erwin Deng, Chun Der Lee, and Rachel Lee "In collaboration with mask suppliers for change management enhancement", Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010K (28 June 2013); https://doi.org/10.1117/12.2028296

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