Laser-induced damage resistance of 266nm AR coatings

Byungil Cho; Andy Lyu; Mark Feldman

doi:10.1117/12.2030738

14 November 2013 Laser-induced damage resistance of 266nm AR coatings

Byungil Cho, Andy Lyu, Mark Feldman

Proceedings Volume 8885, Laser-Induced Damage in Optical Materials: 2013; 888524 (2013) https://doi.org/10.1117/12.2030738
Event: SPIE Laser Damage, 2013, Boulder, Colorado, United States

Abstract

The 266 nm AR coatings consisting of Sc₂O₃/SiO₂ and HfO₂/SiO₂ were deposited on fused silica and CaF₂ substrates. The laser damage resistance (LDR) was measured to determine the laser fluence that a coating can withstand without damaging when exposed to a large number of pulses. The LDRs of Sc₂O₃/SiO₂ AR coatings were higher than those of HfO₂/SiO₂ AR coatings. The absorption, subsurface damage and the surface roughness of the substrates were measured and were correlated with the LDR of AR coatings. The LDR generally decreased as the subsurface damage size increased. The substrate with the largest subsurface damage showed the relatively high absorption of ~220 ppm at 266 nm compared to other substrates with the smaller subsurface damage. The LDR of Sc₂O₃/SiO₂ AR coating on it was the lowest (9.9 J/cm²). No correlation between the surface roughness and the LDR of AR coatings was found. Improving the polishing process was concluded to be an important factor in increasing the LDR of the AR coating. The laser damage morphology on AR coating was also studied.

Citation Download Citation

Byungil Cho, Andy Lyu, and Mark Feldman "Laser-induced damage resistance of 266nm AR coatings", Proc. SPIE 8885, Laser-Induced Damage in Optical Materials: 2013, 888524 (14 November 2013); https://doi.org/10.1117/12.2030738

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