Optical characterization of high index metal oxide films for UV/VIS applications, prepared by Plasma Ion Assisted Deposition

O. Stenzel; S. Wilbrandt; N. Kaiser

doi:10.1117/12.2196197

23 September 2015 Optical characterization of high index metal oxide films for UV/VIS applications, prepared by Plasma Ion Assisted Deposition

O. Stenzel, S. Wilbrandt, N. Kaiser

Author Affiliations +

Proceedings Volume 9627, Optical Systems Design 2015: Advances in Optical Thin Films V; 962709 (2015) https://doi.org/10.1117/12.2196197
Event: SPIE Optical Systems Design, 2015, Jena, Germany

Abstract

Oxide coatings have been prepared by PIAD by means of a Leybold Syrus pro 1100 deposition system. Focus was placed on tantalum pentoxide, hafnium oxide, and zirconium oxide films. Coating characterization pursued the determination of the refractive index in the VIS/UV spectral regions, as well as the geometrical film thickness. In situ spectrophotometry was used to obtain information about the shift of the coatings. Measurements of the coating stress as well as EDX characterization have further been performed to complete the picture.

Results are presented which provide information about the correlation between deposition parameters (Assistance, choice of working gas) and the optical properties of the films. Correlations between optical and non-optical (stress, EDXresults) properties are further presented and discussed in terms of classical models. Reproducibility issues are discussed, too.

Citation Download Citation

O. Stenzel, S. Wilbrandt, and N. Kaiser "Optical characterization of high index metal oxide films for UV/VIS applications, prepared by Plasma Ion Assisted Deposition", Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 962709 (23 September 2015); https://doi.org/10.1117/12.2196197

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