Multiple scale modeling of Al2O3 thin film growth in an ion beam sputtering process

Marcus Turowski; Marco Jupé; Thomas Melzig; Andreas Pflug; Detlev Ristau

doi:10.1117/12.2191049

23 September 2015 Multiple scale modeling of Al₂O₃ thin film growth in an ion beam sputtering process

Marcus Turowski, Marco Jupé, Thomas Melzig, Andreas Pflug, Detlev Ristau

Proceedings Volume 9627, Optical Systems Design 2015: Advances in Optical Thin Films V; 96271M (2015) https://doi.org/10.1117/12.2191049
Event: SPIE Optical Systems Design, 2015, Jena, Germany

Abstract

A multiple scale model approach is presented in order to investigate Al₂O₃ thin film growth in the framework of an existing Ion Beam Sputtering (IBS) coating process. Therefore, several simulation techniques are combined via optimized interfaces for realizing the concept of a virtual coater. Characteristic coating process parameters of the IBS coating plant are applied as input parameters to model the material transport in the chamber, the energy and angular distribution of the coating material at the substrate, the formation of structural thin film properties, and the optical as well as the electronic layer properties. The resulting thin film properties are validated to the data of an experimental IBS Al₂O₃ single layer prepared applying the underlying coating facility. The comparison accounts for a good agreement between the modeled layer properties using the virtual coater concept and the experimental characterization data.

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Marcus Turowski, Marco Jupé, Thomas Melzig, Andreas Pflug, and Detlev Ristau "Multiple scale modeling of Al₂O₃ thin film growth in an ion beam sputtering process", Proc. SPIE 9627, Optical Systems Design 2015: Advances in Optical Thin Films V, 96271M (23 September 2015); https://doi.org/10.1117/12.2191049

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KEYWORDS

Coating

Thin film growth

Chemical species

Aluminum

Monte Carlo methods

Thin films

Oxygen

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