Paper
23 October 2015 EUV or 193i: Who wins the center stage for 7nm node HVM in 2018?
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Abstract
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© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yoshinori Nagaoka and Junji Miyazaki "EUV or 193i: Who wins the center stage for 7nm node HVM in 2018?", Proc. SPIE 9635, Photomask Technology 2015, 963510 (23 October 2015); https://doi.org/10.1117/12.2208944
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KEYWORDS
Extreme ultraviolet

Photomasks

Extreme ultraviolet lithography

Lithography

Pellicles

Double patterning technology

Inspection

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