VizGlow-MPS: a multi-fidelity process simulator for fast, yet accurate, semiconductor process design and optimization

Dmitry Levko; Rochan Upadhyay; Kenta Suzuki; Chandrasekhar Shukla; Laxminarayan Raja

doi:10.1117/12.2614241

13 June 2022 VizGlow-MPS: a multi-fidelity process simulator for fast, yet accurate, semiconductor process design and optimization

Dmitry Levko, Rochan Upadhyay, Kenta Suzuki, Chandrasekhar Shukla, Laxminarayan Raja

Author Affiliations +

Proceedings Volume PC12056, Advanced Etch Technology and Process Integration for Nanopatterning XI; PC1205606 (2022) https://doi.org/10.1117/12.2614241
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

We present a multi-fidelity process simulator ‘VizGlow-MPS’ that combines well-established high-fidelity models with a reduced-order model surrogate. The high-fidelity model provides experimentally validated results for equipment operation that informs the reduced-order model that predicts results in a few minutes of wall-clock time. The approach constitutes a ‘digital twin’ for process reactors with multiple levels of fidelity that a process engineering can choose from. This approach is demonstrated on c-C4F8 inductively coupled plasma and pulsed CF4/H2 capacitively coupled plasma widely used in etching applications.

Conference Presentation

Citation Download Citation

Dmitry Levko, Rochan Upadhyay, Kenta Suzuki, Chandrasekhar Shukla, and Laxminarayan Raja "VizGlow-MPS: a multi-fidelity process simulator for fast, yet accurate, semiconductor process design and optimization", Proc. SPIE PC12056, Advanced Etch Technology and Process Integration for Nanopatterning XI, PC1205606 (13 June 2022); https://doi.org/10.1117/12.2614241

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