Ruthenium attenuated phase-shifting structure fabrication for contact-hole applications

Weilun Chao; Dong-Seok Nam; Sharon Oh; Sarath Samdurala; Eric Gullikson; Farhad Salmassi; Anthony Yen; Patrick Naulleau

doi:10.1117/12.2645263

31 October 2022 Ruthenium attenuated phase-shifting structure fabrication for contact-hole applications

Weilun Chao, Dong-Seok Nam, Sharon Oh, Sarath Samdurala, Eric Gullikson, Farhad Salmassi, Anthony Yen, Patrick Naulleau

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Proceedings Volume PC12292, International Conference on Extreme Ultraviolet Lithography 2022; PC122920Y (2022) https://doi.org/10.1117/12.2645263
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

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Weilun Chao, Dong-Seok Nam, Sharon Oh, Sarath Samdurala, Eric Gullikson, Farhad Salmassi, Anthony Yen, and Patrick Naulleau "Ruthenium attenuated phase-shifting structure fabrication for contact-hole applications", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC122920Y (31 October 2022); https://doi.org/10.1117/12.2645263

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